Photoresists are light-sensitive resins used in a variety of technological applications. In most applications, however, photoresists are generally used as sacrificial layers or a structural layer that remains on the fabrication substrate. Thin layers of patterned 1002F photoresist were fabricated and released to form a freestanding film. Films of thickness in the range of 4.5–250 μm were patterned with through-holes to a resolution of 5 μm and an aspect ratio of up to 6:1. Photoresist films could be reliably released from the substrate after a 12-hour immersion in water. The Young’s modulus of a 50 μm-thick film was 1.43 ± 0.20 GPa. Use of the films as stencils for patterning sputtered metal onto a surface was demonstrated. These 1002F stencils were used multiple times without deterioration in feature quality. Furthermore, the films provided biocompatible, transparent surfaces of low autofluorescence on which cells could be grown. Culture of cells on a film with an isolated small pore enabled a single cell to be accessed through the underlying channel and loaded with exogenous molecules independently of nearby cells. Thus 1002F photoresist was patterned into thin, flexible, free-standing films that will have numerous applications in the biological and MEMS fields.
展开▼
