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Annealing temperature and environment effects on ZnO nanocrystals embedded in SiO2: a photoluminescence and TEM study

机译:退火温度和环境对嵌入SiO2中的ZnO纳米晶体的影响:光致发光和TEM研究

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摘要

We report on efficient ZnO nanocrystal (ZnO-NC) emission in the near-UV region. We show that luminescence from ZnO nanocrystals embedded in a SiO2 matrix can vary significantly as a function of the annealing temperature from 450°C to 700°C. We manage to correlate the emission of the ZnO nanocrystals embedded in SiO2 thin films with transmission electron microscopy images in order to optimize the fabrication process. Emission can be explained using two main contributions, near-band-edge emission (UV range) and defect-related emissions (visible). Both contributions over 500°C are found to be size dependent in intensity due to a decrease of the absorption cross section. For the smallest-size nanocrystals, UV emission can only be accounted for using a blueshifted UV contribution as compared to the ZnO band gap. In order to further optimize the emission properties, we have studied different annealing atmospheres under oxygen and under argon gas. We conclude that a softer annealing temperature at 450°C but with longer annealing time under oxygen is the most preferable scenario in order to improve near-UV emission of the ZnO nanocrystals embedded in an SiO2 matrix.
机译:我们报告了在近紫外线区域有效的ZnO纳米晶体(ZnO-NC)发射。我们表明嵌入在SiO2基质中的ZnO纳米晶体的发光可以随着退火温度从450°C到700°C的变化而显着变化。我们设法使嵌入在SiO2薄膜中的ZnO纳米晶体的发射与透射电子显微镜图像相关联,以优化制造过程。可以用两个主要贡献来解释发射,即近带边缘发射(UV范围)和与缺陷相关的发射(可见光)。由于吸收横截面的减小,发现超过500°C的两种贡献在强度上都取决于大小。对于最小尺寸的纳米晶体,与ZnO带隙相比,只能使用蓝移UV贡献来解释UV发射。为了进一步优化发射性能,我们研究了在氧气和氩气下的不同退火气氛。我们得出结论,为了改善嵌入在SiO2基质中的ZnO纳米晶体的近紫外发射,最优选的方案是在450°C下较软的退火温度,但在氧气下具有更长的退火时间。

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