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Observation of ‘hidden’ planar defects in boron carbide nanowires and identification of their orientations

机译:观察碳化硼纳米线中隐藏的平面缺陷并确定其方向

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摘要

The physical properties of nanostructures strongly depend on their structures, and planar defects in particular could significantly affect the behavior of the nanowires. In this work, planar defects (twins or stacking faults) in boron carbide nanowires are extensively studied by transmission electron microscopy (TEM). Results show that these defects can easily be invisible, i.e., no presence of characteristic defect features like modulated contrast in high-resolution TEM images and streaks in diffraction patterns. The simplified reason of this invisibility is that the viewing direction during TEM examination is not parallel to the (001)-type planar defects. Due to the unique rhombohedral structure of boron carbide, planar defects are only distinctive when the viewing direction is along the axial or short diagonal directions ([100], [010], or 1¯10) within the (001) plane (in-zone condition). However, in most cases, these three characteristic directions are not parallel to the viewing direction when boron carbide nanowires are randomly dispersed on TEM grids. To identify fault orientations (transverse faults or axial faults) of those nanowires whose planar defects are not revealed by TEM, a new approach is developed based on the geometrical analysis between the projected preferred growth direction of a nanowire and specific diffraction spots from diffraction patterns recorded along the axial or short diagonal directions out of the (001) plane (off-zone condition). The approach greatly alleviates tedious TEM examination of the nanowire and helps to establish the reliable structure–property relations. Our study calls attention to researchers to be extremely careful when studying nanowires with potential planar defects by TEM. Understanding the true nature of planar defects is essential in tuning the properties of these nanostructures through manipulating their structures.
机译:纳米结构的物理特性在很大程度上取决于其结构,尤其是平面缺陷会显着影响纳米线的行为。在这项工作中,通过透射电子显微镜(TEM)广泛研究了碳化硼纳米线中的平面缺陷(孪晶或堆垛层错)。结果表明,这些缺陷很容易被看不见,即不存在特征性缺陷特征,如高分辨率TEM图像中的调制对比度和衍射图样中的条纹。这种不可见性的简化原因是,TEM检查期间的观察方向不平行于(001)型平面缺陷。由于碳化硼具有独特的菱面体结构,仅当观察方向沿轴向或短对角线方向([100],[010]或 1 10 )(区域内条件)。然而,在大多数情况下,当碳化硼纳米线随机分布在TEM网格上时,这三个特征方向并不平行于观察方向。为了确定那些未通过TEM揭示出平面缺陷的纳米线的断层取向(横向断层或轴向断层),基于几何学分析,开发了一种新方法,基于纳米线的预计优先生长方向与记录的衍射图样中的特定衍射点之间的几何关系沿轴向或短对角线方向离开(001)平面(离区条件)。该方法极大地减轻了纳米线的繁琐的TEM检查,并有助于建立可靠的结构-属性关系。我们的研究呼吁研究人员注意通过TEM研究具有潜在平面缺陷的纳米线时要格外小心。了解平面缺陷的真实性质对于通过操纵纳米结构的结构来调节其性能至关重要。

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