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Improving the Photoelectric Characteristics of MoS2 Thin Films by Doping Rare Earth Element Erbium

机译:掺杂稀土元素Er改善MoS2薄膜的光电特性

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摘要

We investigated the surface morphologies, crystal structures, and optical characteristics of rare earth element erbium (Er)-doped MoS2 (Er: MoS2) thin films fabricated on Si substrates via chemical vapor deposition (CVD). The surface mopography, crystalline structure, light absorption property, and the photoelectronic characteristics of the Er: MoS2 films were studied. The results indicate that doping makes the crystallinity of MoS2 films better than that of the undoped film. Meanwhile, the electron mobility and conductivity of the Er-doped MoS2 films increase about one order of magnitude, and the current-voltage (I-V) and the photoelectric response characteristics of the Er:MoS2/Si heterojunction increase significantly. Moreover, Er-doped MoS2 films exhibit strong light absorption and photoluminescence in the visible light range at room temperature; the intensity is enhanced by about twice that of the undoped film. The results indicate that the doping of MoS2 with Er can significantly improve the photoelectric characteristics and can be used to fabricate highly efficient luminescence and optoelectronic devices.
机译:我们研究了通过化学气相沉积(CVD)在Si衬底上制备的掺稀土元素(Er)的MoS2(Er:MoS2)薄膜的表面形态,晶体结构和光学特性。研究了Er:MoS2薄膜的表面光刻,晶体结构,光吸收性能和光电特性。结果表明,掺杂使MoS2薄膜的结晶度优于未掺杂的薄膜。同时,掺Er的MoS2薄膜的电子迁移率和电导率增加大约一个数量级,并且Er:MoS2 / Si异质结的电流电压(I-V)和光电响应特性显着增加。此外,掺Er的MoS2薄膜在室温下在可见光范围内表现出较强的光吸收和光致发光性能。强度提高了不掺杂薄膜的两倍。结果表明,用Er掺杂MoS2可以显着改善光电特性,可用于制造高效的发光和光电器件。

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