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Current rectifying and resistive switching in high density BiFeO3 nanocapacitor arrays on Nb-SrTiO3 substrates

机译:Nb-SrTiO3衬底上高密度BiFeO3纳米电容器阵列中的电流整流和电阻切换

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摘要

Ultrahigh density well-registered oxide nanocapacitors are very essential for large scale integrated microelectronic devices. We report the fabrication of well-ordered multiferroic BiFeO3 nanocapacitor arrays by a combination of pulsed laser deposition (PLD) method and anodic aluminum oxide (AAO) template method. The capacitor cells consist of BiFeO3/SrRuO3 (BFO/SRO) heterostructural nanodots on conductive Nb-doped SrTiO3 (Nb-STO) substrates with a lateral size of ~60 nm. These capacitors also show reversible polarization domain structures, and well-established piezoresponse hysteresis loops. Moreover, apparent current-rectification and resistive switching behaviors were identified in these nanocapacitor cells using conductive-AFM technique, which are attributed to the polarization modulated p-n junctions. These make it possible to utilize these nanocapacitors in high-density (>100 Gbit/inch2) nonvolatile memories and other oxide nanoelectronic devices.
机译:超高密度,配准良好的氧化物纳米电容器对于大规模集成微电子器件非常重要。我们报告通过脉冲激光沉积(PLD)方法和阳极氧化铝(AAO)模板方法相结合的制造有序的多铁性BiFeO3纳米电容器阵列。电容器单元由BiFeO3 / SrRuO3(BFO / SRO)异质结构纳米点组成,该纳米点位于Nb掺杂的SrTiO3(Nb-STO)导电衬底上,横向尺寸约为60 nm。这些电容器还显示出可逆的极化域结构,并建立了良好的压电响应磁滞回线。此外,使用导电AFM技术在这些纳米电容器电池中发现了明显的电流整流和电阻切换行为,这归因于极化调制的p-n结。这些使得在高密度(> 100 Gbit / inch 2 )非易失性存储器和其他氧化物纳米电子器件中利用这些纳米电容器成为可能。

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