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Robust Direct Bandgap Characteristics of One- and Two-Dimensional ReS2

机译:一维和二维ReS2的鲁棒直接带隙特性

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摘要

Two-dimensional (2D) transition-metal dichalcogenides (TMDs), most notably, MoS2 and WS2, have attracted significant attention due to their sizable and direct bandgap characteristics. Although several interesting MoS2 and WS2-based optoelectronic devices have been reported, their processability and reproducibility are limited since their electrical properties are strongly dependent of the number of layers, strain and sample sizes. It is highly desirable to have a robust direct bandgap TMD, which is insensitive to those factors. In this work, using density functional theory, we explore the effects of layer number, strain and ribbon width on the electronic properties of ReS2, a new member in the TMD family. The calculation results reveal that for monolayer ReS2, the nature (direct versus indirect) and magnitude of its bandgap are insensitive to strain. Importantly, the predicted bandgap and also charge carrier mobilities are nearly independent of the number of layers. In addition, the direct bandgap of ReS2 nanoribbons is only weakly dependent on their width. These robust characteristics strongly suggest that ReS2 has great potential for applications in optoelectronic nanodevices.
机译:二维(2D)过渡金属二硫化碳(TMD),最显着的是MoS2和WS2,由于其相当大的直接带隙特性而引起了人们的极大关注。尽管已经报道了几种有趣的基于MoS2和WS2的光电器件,但是它们的可加工性和可重复性受到限制,因为它们的电学性能强烈取决于层数,应变和样品大小。非常需要一种对这些因素不敏感的稳健的直接带隙TMD。在这项工作中,我们使用密度泛函理论,探索了层数,应变和碳带宽度对ReS2(TMD系列的新成员)的电子性能的影响。计算结果表明,对于单层ReS2,其带隙的性质(直接与间接)和幅度对应变不敏感。重要的是,预测的带隙以及电荷载流子迁移率几乎与层数无关。此外,ReS2纳米带的直接带隙仅在很小程度上取决于其宽度。这些强大的特性强烈表明,ReS2在光电纳米器件中具有巨大的应用潜力。

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