首页> 美国卫生研究院文献>Scientific Reports >A Self-Limiting Electro-Ablation Technique for the Top-Down Synthesis of Large-Area Monolayer Flakes of 2D Materials
【2h】

A Self-Limiting Electro-Ablation Technique for the Top-Down Synthesis of Large-Area Monolayer Flakes of 2D Materials

机译:自限电烧蚀技术用于自顶向下合成二维材料的大面积单层薄片

代理获取
本网站仅为用户提供外文OA文献查询和代理获取服务,本网站没有原文。下单后我们将采用程序或人工为您竭诚获取高质量的原文,但由于OA文献来源多样且变更频繁,仍可能出现获取不到、文献不完整或与标题不符等情况,如果获取不到我们将提供退款服务。请知悉。

摘要

We report the discovery of an electrochemical process that converts two dimensional layered materials of arbitrary thicknesses into monolayers. The lateral dimensions of the monolayers obtained by the process within a few seconds time at room temperature were as large as 0.5 mm. The temporal and spatial dynamics of this physical phenomenon, studied on MoS2 flakes using ex-situ AFM imaging, Raman mapping, and photoluminescence measurements trace the origin of monolayer formation to a substrate-assisted self-limiting electrochemical ablation process. Electronic structure and atomistic calculations point to the interplay between three essential factors in the process: (1) strong covalent interaction of monolayer MoS2 with the substrate; (2) electric-field induced differences in Gibbs free energy of exfoliation; (3) dispersion of MoS2 in aqueous solution of hydrogen peroxide. This process was successful in obtaining monolayers of other 2D transition metal dichalcogenides, like WS2 and MoTe2 as well.
机译:我们报告了电化学过程的发现,该过程将任意厚度的二维分层材料转换为单层。通过该方法在室温下几秒钟内获得的单层的横向尺寸大到0.5毫米。使用异位原子力显微镜成像,拉曼映射和光致发光测量在MoS2薄片上研究了这种物理现象的时空动态,追踪了单层形成的起源到基质辅助的自限电化学烧蚀过程。电子结构和原子计算指出了该过程中三个基本因素之间的相互作用:(1)单层MoS2与底物的强共价相互作用; (2)电场引起的剥落吉布斯自由能的差异; (3)将MoS 2分散在过氧化氢水溶液中。该方法成功地获得了其他2D过渡金属二卤化物单分子层,例如WS2和MoTe2。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
代理获取

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号