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Optically detecting the edge-state of a three-dimensional topological insulator under ambient conditions by ultrafast infrared photoluminescence spectroscopy

机译:通过超快红外光致发光光谱法在环境条件下光学检测三维拓扑绝缘体的边缘状态

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摘要

Ultrafast infrared photoluminescence spectroscopy was applied to a three-dimensional topological insulator TlBiSe2 under ambient conditions. The dynamics of the luminescence exhibited bulk-insulating and gapless characteristics bounded by the bulk band gap energy. The existence of the topologically protected surface state and the picosecond-order relaxation time of the surface carriers, which was distinguishable from the bulk response, were observed. Our results provide a practical method applicable to topological insulators under ambient conditions for device applications.
机译:在环境条件下,将超快红外光致发光光谱学应用于三维拓扑绝缘体TlBiSe2。发光的动力学表现出由体带隙能量限制的体绝缘和无间隙特性。观察到存在拓扑保护的表面状态和表面载体的皮秒级弛豫时间,这与本体响应是不同的。我们的结果提供了一种适用于设备应用环境条件下拓扑绝缘子的实用方法。

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