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Features of electron gas in InAs nanowires imposed by interplay between nanowire geometry doping and surface states

机译:InAs纳米线中电子气体的特征是由纳米线的几何形状掺杂和表面状态之间的相互作用所引起的

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摘要

We present a study of electron gas properties in InAs nanowires determined by interaction between nanowire geometry, doping and surface states. The electron gas density and space distribution are calculated via self-consistent solution of coupled Schroedinger and Poisson equations in the nanowires with a hexagonal cross-section. We show that the density of surface states and the nanowire width define the spatial distribution of the electrons. Three configurations can be distinguished, namely the electrons are localized in the center of the wire, or they are arranged in a uniform tubular distribution, or finally in a tubular distribution with additional electron accumulation at the corners of the nanowire. The latter one is dominating for most experimentally obtained nanowires. N-type doping partly suppresses electron accumulation at the nanowire corners. The electron density calculated for both, various nanowire widths and different positions of the Fermi level at the nanowire surface, is compared with the experimental data for intrinsic InAs nanowires. Suitable agreement is obtained by assuming a Fermi level pinning at 60 to 100 meV above the conduction band edge, leading to a tubular electron distribution with accumulation along the corners of the nanowire.
机译:我们目前对由纳米线几何形状,掺杂和表面状态之间的相互作用决定的InAs纳米线中电子气性质的研究。通过具有六边形横截面的纳米线中Schroedinger和Poisson耦合方程的自洽解,计算出电子气密度和空间分布。我们表明,表面态的密度和纳米线的宽度定义了电子的空间分布。可以区分三种构型,即电子位于导线的中心,或者它们排列成均匀的管状分布,或者最终排列成管状分布,并且在纳米线的拐角处有额外的电子积累。对于大多数实验获得的纳米线,后者占主导地位。 N型掺杂部分抑制了纳米线角落的电子积累。将针对各种纳米线宽度和纳米线表面的费米能级的不同位置计算的电子密度与本征InAs纳米线的实验数据进行了比较。通过假设费米能级钉扎在导带边缘之上60至100 meV,从而导致管状电子分布并沿着纳米线的角积累,从而获得合适的一致性。

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