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Hf/Sb co-doping induced a high thermoelectric performance of ZrNiSn: First-principles calculation

机译:Hf / Sb共掺杂引起ZrNiSn的高热电性能:第一性原理计算

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摘要

Previous experiments showed that Hf/Sb co-doping in ZrNiSn impressively improved the electrical conductivity (σ). To explore the physical reasons for this improvement, the electronic structures of HfxZr1−xNiSn1−ySby (x = 0, 0.25, 0.5; y = 0, 0.02) have been systematically investigated by using the first-principles method and semiclassical Boltzmann transport theory. 50% Hf doping at Zr site in ZrNiSn simultaneously increases the degeneracy and dispersion of energy bands near the conduction band edge, which are helpful to optimizing Seebeck coefficient and slightly improving σ. Furthermore, 2% Sb co-doping at Sn site in Hf0.5Zr0.5NiSn not only increases total density of states near the Fermi energy but also retains high mobility, and N v reaches eleven at the conduction band minimum, thereby inducing a large improvement in σ. Additionally, the Bader charge analysis shows the reason why Sb co-doping supplies more electrons. It is most likely derived from that Sb loses more electrons and Sb-Ni has a stronger hybridization than Sn-Ni. Moreover, we predict that the ZT of Hf0.5Zr0.5NiSn0.98Sb0.02 at 1000 K can reach 1.37 with the carrier concentration of 7.56 × 1018 cm−3, indicating that Hf/Sb co-doping may be an effective approach in optimizing thermoelectric properties of ZrNiSn alloy compounds.
机译:先前的实验表明,ZrNiSn中的Hf / Sb共掺杂显着改善了电导率(σ)。为了探究这种改进的物理原因,我们使用第一原理方法和半经典玻尔兹曼输运理论对HfxZr1-xNiSn1-ySby(x = 0,0.25,0.5; y; = 0,0.02)的电子结构进行了系统研究。在ZrNiSn的Zr部位掺杂50%的Hf会同时增加导带边缘附近的能带的简并性和色散,这有助于优化塞贝克系数并稍微提高σ。此外,在Hf0.5Zr0.5NiSn中的Sn处Sb共掺杂2%的Sb不仅增加了费米能量附近的态的总密度,而且保持了高迁移率,并且N v在导带最小值处达到11,从而引起了很大的改善在σ中。此外,Bader电荷分析显示了Sb共掺杂提供更多电子的原因。很有可能是由于Sb失去了更多的电子,并且Sb-Ni的杂化度比Sn-Ni强。此外,我们预测Hf0.5Zr0.5NiSn0.98Sb0.02在1000 K时的ZT可以达到1.37,载流子浓度为7.56×10 18 cm -3 ,表明Hf / Sb共掺杂可能是优化ZrNiSn合金化合物热电性能的有效方法。

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