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A Resonant Pressure Microsensor Based on Double-Ended Tuning Fork and Electrostatic Excitation/Piezoresistive Detection

机译:基于双音叉和静电激励/压阻检测的共振压力微传感器

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摘要

This paper presents a resonant pressure microsensor relying on electrostatic excitation and piezoresistive detection where two double-ended tuning forks were used as resonators, enabling differential outputs. Pressure under measurement caused the deformation of the pressure sensitive membrane, leading to stress buildup of the resonator under electrostatic excitation with a corresponding shift of the resonant frequency detected piezoresistively. The proposed microsensor was fabricated by simplified SOI-MEMS technologies and characterized by both open-loop and closed-loop circuits, producing a quality factor higher than 10,000, a sensitivity of 79.44 Hz/kPa and an accuracy rate of over 0.01% F.S. In comparison to the previously reported resonant piezoresistive sensors, the proposed device used single-crystal silicon as piezoresistors, which was featured with low DC biased voltages, simple sensing structures and fabrication steps. In addition, the two double-ended tuning forks were used as resonators, producing high quality factors and differential outputs, which further improved the sensor performances.
机译:本文介绍了一种依靠静电激励和压阻检测的谐振压力微传感器,其中使用两个双音叉作为谐振器,从而实现差分输出。被测压力引起压敏膜的变形,导致在静电激励下谐振器的应力积累,并相应地压阻检测到谐振频率的变化。拟议的微传感器采用简化的SOI-MEMS技术制造,并具有开环和闭环电路的特征,其品质因数高于10,000,灵敏度为79.44 Hz / kPa,准确率超过0.01%F.S.与先前报道的谐振压阻传感器相比,该器件使用单晶硅作为压敏电阻,具有低直流偏置电压,简单的感测结构和制造步骤的特点。此外,两个双端音叉用作谐振器,可产生高品质因数和差分输出,从而进一步提高了传感器性能。

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