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Fabrication and characterization of nanostructures on insulator substrates by electron-beam-induced deposition

机译:通过电子束诱导沉积在绝缘体基底上制备和表征纳米结构

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摘要

The fabrication, characterization, and decoration with metallic nanoparticles of nanostructures such as nanowhiskers, nanodendrites, and fractal-like nanotrees on insulator substrates by electron-beam-induced deposition (EBID) are reviewed. Nanostructures with different morphologies of whiskers, dendrites, or trees are fabricated on insulator (Al2O3 or SiO2) substrates by EBID in transmission electron microscopes by controlling the irradiation conditions such as the electron beam intensity. The growth of the nanostructure is related to the accumulation of charges on the surface of a substrate during electron-beam irradiation. A high concentration of the target metallic element and nanocrystal grains of the element are contained in the fabricated nanostructures. The process of growth of the nanostructures is explained qualitatively on the basis of mechanisms in which the formation of the nanostructures is considered to be related to the nanoscaled unevenness of the charge distribution on the surface of the substrate, the movement of the charges to the convex surface of the substrate, and the accumulation of charges at the tip of the grown nanostructure. Novel composite structures of Pt nanoparticle/tungsten (W) nanodendrite or Au nanoparticle/W nanodendrite are fabricated by the decoration of W nanodendrites with metallic elements. Because they have superior features, such as a large specific surface area, a freestanding structure on substrates, a typical size of several nanometers of the tip or the branch, and high purity, the nanostructures may have applications in technologies such as catalysts, sensors, and electron emitters. However, there are still some subjects that should be further studied before their application.
机译:综述了通过电子束诱导沉积(EBID)在绝缘体衬底上使用纳米结构的金属纳米粒子(如纳米晶须,纳米树枝状晶体和分形的纳米树)的制造,表征和装饰。通过控制电子束强度等辐照条件,通过透射电子显微镜中的EBID,在绝缘体(Al2O3或SiO2)衬底上制备了晶须,树枝状晶体或树木的不同形态的纳米结构。纳米结构的生长与电子束照射期间衬底表面上电荷的积累有关。在所制造的纳米结构中包含高浓度的目标金属元素和该元素的纳米晶粒。基于以下机理定性地解释了纳米结构的生长过程,在该机理中,纳米结构的形成被认为与基底表面上电荷分布的纳米级不均匀性,电荷向凸面的运动有关。衬底的表面,以及在生长的纳米结构尖端的电荷积累。通过用金属元素装饰W纳米枝晶,制备了Pt纳米粒子/钨(W)纳米枝晶或Au纳米粒子/ W纳米枝晶的新型复合结构。由于它们具有卓越的功能,例如较大的比表面积,基底上的独立式结构,尖端或分支的典型尺寸为几纳米,以及高纯度,因此纳米结构可能会应用于诸如催化剂,传感器,和电子发射器。但是,仍有一些主题在应用之前需要进一步研究。

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