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The Effect of Random Error in Exposure Measurement upon the Shape of the Exposure Response

机译:曝光测量中的随机误差对曝光响应形状的影响

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摘要

Although statistical analyses of epidemiological data usually treat the exposure variable as being known without error, estimated exposures in epidemiological studies often involve considerable uncertainty. This paper investigates the theoretical effect of random errors in exposure measurement upon the observed shape of the exposure response. The model utilized assumes that true exposures are log-normally distributed, and multiplicative measurement errors are also log-normally distributed and independent of the true exposures. Under these conditions it is shown that whenever the true exposure response is proportional to exposure to a power r, the observed exposure response is proportional to exposure to a power K, where K < r. This implies that the observed exposure response exaggerates risk, and by arbitrarily large amounts, at sufficiently small exposures. It also follows that a truly linear exposure response will appear to be supra-linear—i.e., a linear function of exposure raised to the K-th power, where K is less than 1.0. These conclusions hold generally under the stated log-normal assumptions whenever there is any amount of measurement error, including, in particular, when the measurement error is unbiased either in the natural or log scales. Equations are provided that express the observed exposure response in terms of the parameters of the underlying log-normal distribution. A limited investigation suggests that these conclusions do not depend upon the log-normal assumptions, but hold more widely. Because of this problem, in addition to other problems in exposure measurement, shapes of exposure responses derived empirically from epidemiological data should be treated very cautiously. In particular, one should be cautious in concluding that the true exposure response is supra-linear on the basis of an observed supra-linear form.
机译:尽管流行病学数据的统计分析通常将暴露变量视为已知变量而没有错误,但流行病学研究中的估计暴露量通常涉及相当大的不确定性。本文研究了曝光测量中随机误差对所观察到的曝光响应形状的理论影响。所使用的模型假设真实暴露呈对数正态分布,并且乘法测量误差也呈对数正态分布且与真实暴露无关。在这些条件下表明,每当真实曝光响应与幂次r的曝光成正比时,观察到的曝光响应就与幂次K的曝光成正比,其中K

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