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Shape measurement method, shape measurement apparatus, tilt measurement method, stage device, exposure apparatus, exposure method, and device manufacturing method

机译:形状测量方法,形状测量设备,倾斜测量方法,载物台设备,曝光设备,曝光方法和设备制造方法

摘要

And a shape measuring method of measuring the reflective surface of the stage 7XS 4 that moves along the reference plane, the shape of 7YS. While moving along the Y-axis direction stage 4, is measured at two positions spaced apart in the Z-axis direction, a one-dimensional shape of the reflecting surface 7XS the Y-axis direction, the difference of the one-dimensional shape data of the one and the other the the Y-axis direction while the position adjustment stage 4 measurement results based on measurement beam LWXP being irradiated simultaneously two positions to obtain the corresponding first data, spaced in the Z-axis direction of the reflecting surface 7XS is constant and moves, by measuring at a plurality of locations the displacement of the attitude control axis stage 4 during this movement, to obtain the second data corresponding to changes in the rotation amount around the the Y-axis about the Y-axis direction, the and correcting the 1-dimensional data based on the fourth data obtained by linear approximation corresponding to the third data on a difference between said second data with first data.
机译:以及一种形状测量方法,其测量平台7XS 4的沿参考平面移动的反射表面,即7YS的形状。在沿Y轴方向平台4移动的同时,在Z轴方向上隔开的两个位置处测量反射面的一维形状7XS,Y轴方向上的一维形状数据的差。在同时将基于测量光束LWXP的位置调整台4的测量结果同时照射到两个位置以获得对应的第一数据的位置调整台4的Y轴方向上,在反射面7XS的Z轴方向常数,并通过在该位置测量姿态控制轴台4的位移来进行移动,以获得与绕Y轴围绕Y轴方向的旋转量变化相对应的第二数据,基于所述第二数据与第一数据之间的差,基于通过与第三数据相对应的线性近似而获得的第四数据,对一维数据进行校正。

著录项

  • 公开/公告号JPWO2004051184A1

    专利类型

  • 公开/公告日2006-04-06

    原文格式PDF

  • 申请/专利权人 株式会社ニコン;

    申请/专利号JP20040556903

  • 发明设计人 神谷 三郎;金究 豊;

    申请日2003-12-03

  • 分类号G01B11/24;G01B11/26;H01L21/027;

  • 国家 JP

  • 入库时间 2022-08-21 21:49:03

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