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Design Optimization and Fabrication of High-Sensitivity SOI Pressure Sensors with High Signal-to-Noise Ratios Based on Silicon Nanowire Piezoresistors

机译:基于硅纳米线压敏电阻的高信噪比高灵敏度SOI压力传感器的设计优化与制造

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摘要

In order to meet the requirement of high sensitivity and signal-to-noise ratios (SNR), this study develops and optimizes a piezoresistive pressure sensor by using double silicon nanowire (SiNW) as the piezoresistive sensing element. First of all, ANSYS finite element method and voltage noise models are adopted to optimize the sensor size and the sensor output (such as sensitivity, voltage noise and SNR). As a result, the sensor of the released double SiNW has 1.2 times more sensitivity than that of single SiNW sensor, which is consistent with the experimental result. Our result also displays that both the sensitivity and SNR are closely related to the geometry parameters of SiNW and its doping concentration. To achieve high performance, a p-type implantation of 5 × 1018 cm−3 and geometry of 10 µm long SiNW piezoresistor of 1400 nm × 100 nm cross area and 6 µm thick diaphragm of 200 µm × 200 µm are required. Then, the proposed SiNW pressure sensor is fabricated by using the standard complementary metal-oxide-semiconductor (CMOS) lithography process as well as wet-etch release process. This SiNW pressure sensor produces a change in the voltage output when the external pressure is applied. The involved experimental results show that the pressure sensor has a high sensitivity of 495 mV/V·MPa in the range of 0–100 kPa. Nevertheless, the performance of the pressure sensor is influenced by the temperature drift. Finally, for the sake of obtaining accurate and complete information over wide temperature and pressure ranges, the data fusion technique is proposed based on the back-propagation (BP) neural network, which is improved by the particle swarm optimization (PSO) algorithm. The particle swarm optimization–back-propagation (PSO–BP) model is implemented in hardware using a 32-bit STMicroelectronics (STM32) microcontroller. The results of calibration and test experiments clearly prove that the PSO–BP neural network can be effectively applied to minimize sensor errors derived from temperature drift.
机译:为了满足高灵敏度和信噪比(SNR)的要求,本研究通过使用双硅纳米线(SiNW)作为压阻传感元件来开发和优化压阻压力传感器。首先,采用ANSYS有限元方法和电压噪声模型来优化传感器尺寸和传感器输出(例如灵敏度,电压噪声和SNR)。结果,发布的双SiNW传感器的灵敏度是单SiNW传感器的1.2倍,这与实验结果一致。我们的结果还表明,灵敏度和SNR都与SiNW的几何参数及其掺杂浓度密切相关。为了实现高性能,p型注入5×10 1 8 cm −3 和10 µm长的SiNW压敏电阻为1400需要横截面为nm×100 nm,厚度为200 µm×200 µm的6 µm膜片。然后,通过使用标准的互补金属氧化物半导体(CMOS)光刻工艺以及湿法刻蚀释放工艺来制造所提出的SiNW压力传感器。当施加外部压力时,此SiNW压力传感器会产生输出电压变化。涉及的实验结果表明,压力传感器在0-100 kPa的范围内具有495 mV / V·MPa的高灵敏度。然而,压力传感器的性能受温度漂移的影响。最后,为了在宽的温度和压力范围内获得准确而完整的信息,提出了一种基于反向传播(BP)神经网络的数据融合技术,并通过粒子群优化(PSO)算法对其进行了改进。粒子群优化-反向传播(PSO-BP)模型是使用32位STMicroelectronics(STM32)微控制器在硬件中实现的。校准和测试实验的结果清楚地证明,PSO-BP神经网络可以有效地用于最大限度地减少由温度漂移引起的传感器误差。

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