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Diamond/Porous Titanium Nitride Electrodes With Superior Electrochemical Performance for Neural Interfacing

机译:具有出色电化学性能的金刚石/多孔氮化钛电极可用于神经接口

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摘要

Robust devices for chronic neural stimulation demand electrode materials which exhibit high charge injection (Qinj) capacity and long-term stability. Boron-doped diamond (BDD) electrodes have shown promise for neural stimulation applications, but their practical applications remain limited due to the poor charge transfer capability of diamond. In this work, we present an attractive approach to produce BDD electrodes with exceptionally high surface area using porous titanium nitride (TiN) as interlayer template. The TiN deposition parameters were systematically varied to fabricate a range of porous electrodes, which were subsequently coated by a BDD thin-film. The electrodes were investigated by surface analysis methods and electrochemical techniques before and after BDD deposition. Cyclic voltammetry (CV) measurements showed a wide potential window in saline solution (between −1.3 and 1.2 V vs. Ag/AgCl). Electrodes with the highest thickness and porosity exhibited the lowest impedance magnitude and a charge storage capacity (CSC) of 253 mC/cm2, which largely exceeds the values previously reported for porous BDD electrodes. Electrodes with relatively thinner and less porous coatings displayed the highest pulsing capacitances (Cpulse), which would be more favorable for stimulation applications. Although BDD/TiN electrodes displayed a higher impedance magnitude and a lower Cpulse as compared to the bare TiN electrodes, the wider potential window likely allows for higher Qinj without reaching unsafe potentials. The remarkable reduction in the impedance and improvement in the charge transfer capacity, together with the known properties of BDD films, makes this type of coating as an ideal candidate for development of reliable devices for chronic neural interfacing.
机译:用于慢性神经刺激的坚固设备需要具有高电荷注入(Qinj)能力和长期稳定性的电极材料。掺硼金刚石(BDD)电极已显示出对神经刺激应用的希望,但由于金刚石的电荷转移能力差,其实际应用仍然受到限制。在这项工作中,我们提出了一种有吸引力的方法,使用多孔氮化钛(TiN)作为层间模板来生产具有极高表面积的BDD电极。系统地改变TiN沉积参数以制造一定范围的多孔电极,然后将其涂覆BDD薄膜。在BDD沉积之前和之后,通过表面分析方法和电化学技术对电极进行了研究。循环伏安法(CV)测量显示盐溶液中的电位窗宽(相对于Ag / AgCl,在-1.3和1.2 V之间)。具有最高厚度和孔隙率的电极表现出最低的阻抗幅度,电荷存储容量(CSC)为253 mC / cm 2 ,大大超过了先前报道的多孔BDD电极的值。具有相对较薄且多孔性较小的涂层的电极显示出最高的脉冲电容(Cpulse),这对于刺激应用而言将更为有利。尽管与裸TiN电极相比,BDD / TiN电极显示出更高的阻抗幅度和更低的Cpulse,但是较宽的电势窗口可能允许更高的Qinj,而不会达到不安全的电势。阻抗的显着降低和电荷转移能力的提高,再加上BDD薄膜的已知性能,使得这种类型的涂层成为开发用于慢性神经接口的可靠设备的理想选择。

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