首页> 中文期刊> 《天津大学学报:英文版》 >Extraction of ULSI Interconnect Resistance at High Frequencies

Extraction of ULSI Interconnect Resistance at High Frequencies

         

摘要

Correct extraction of the ultra-large-scale integrated (ULSI) interconnect components at hight frequencies is very important for evaluating electrical performances of high-speed ULSI circuits.In this paper, the extraction of the interconnect resistance at high frequencies is derived from the Ohm′s law and verified by the software FastHenry.The results are also compared with those of another resistance formula originated from the effective area of the current flowing. The applicability of these two formulae is discussed.The influence of the interconnect geometry on the resistance at high frequencies is studied.The computation indicates that the effect of frequency on the resistance is weak when the skin depth is larger than half of the short side of the rectangular interconnect cross section.With further increase of frequency, the resistance increases obviously. Results imply that conductor with a square cross section exhibits the largest resistance for rectangular conductors of constant cross section area.

著录项

获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号