不同Ti靶电流对Ti掺杂类石墨碳膜的结构和性能的影响

摘要

Ti-doped graphite-like carbon (Ti-GLC) films were synthesized successfully by magnetron sputtering technique.The compositions,microstructures and properties of the Ti-doped GLC films dependent on the parameter of Ti target current were systemically investigated by Raman spectra,X-ray photoelectron spectroscopy (XPS),X-ray diffraction (XRD),scanning electron microscopy (SEM),atomic force microscopy (AFM),nanoindentation and ball-on-disk tribometer.With the increase of the Ti target current,the ratio of sp2 bond and the content of Ti as well as the film hardness and compressive internal stress increase,but the high content of the Ti would result in the loose film due to the formation of the squamose structure.Less incorporated Ti reduces the friction of the GLC film in dry-sliding condition,while pure GLC film exhibits the lowest friction coefficient in water-lubricated condition.Ti-GLC film deposited with low Ti target current shows high wear resistance in both dry-sliding and water-lubricated conditions.%利用磁控溅射的方法成功制备Ti掺杂类石墨碳(Ti-GLC)膜.采用拉曼光谱、X射线光电子谱(ⅪS)、扫描电子显微镜(SEM)、原子力显微镜(AFM)、纳米压痕仪和球盘式摩擦机分别表征不同Ti靶电流下制备的Ti-GLC膜的成分、结构和性能.随着Ti靶电流的增加,薄膜中sp2键的比率和Ti含量增加,同时薄膜的硬度和内应力也增大,但较高的Ti靶电流将会促使薄膜产生鳞片状结构从而使其变疏松.较少的Ti掺入量可以降低GLC膜的干摩擦因数,纯GLC膜在水润滑条件下的摩擦因数最低.在较低Ti靶电流下制备的Ti-GLC膜在于摩擦及水润滑条件下均具有较高的抗磨性能.