新型立体测绘光学系统杂散辐射分析与抑制

摘要

针对国家发明专利《基于集成式共用主镜的双视场立体成像光学系统》(发明专利号：ZL 200910243273.8)中所设计的光学系统，进行了杂散辐射的仿真分析及抑制。为了实现较大基高比的立体测绘，满足内方位元素的高稳定度，以实现对图像的高精度校正，采用了集成式共用主镜的双视场立体成像光学系统，它具有结构紧凑、轻量化及热稳定性好等特点。针对该光学系统独特的光学系统结构型式并实现其工程化，通过仿真并根据杂散光的传播路径进行了分类总结分析，通过采取有效的杂散光抑制措施，光学系统最终的杂散光系数为1.1075%，满足系统的使用要求。%　　Based on the patent “The Optical System of Duel-field Stereoscopic Camera with Integrated Primary Mirror” (Patent Number:ZL 2009 1 0243273.8), the stray light of a new type optical system is ana-lyzed, and stray light suppressing methods are applied to the special optical configuration. In order to make the big-base-height ratio stereoscopic mapping camera have high stability of inner elements and precisely cali-brated images, an integrated dual-line array stereoscopic mapping camera is designed, which has the merits of miniaturization, lightening, structure stabilization and environment adaptability. To analyze the feasibility of the special optical structure, the optical system is molded; the stray light paths are analyzed and classified based on their influences. After the suppressing methods are adopted, the stray light ratio is reduced to 1.1075%, meeting the requirements of optical system.