Microwave Electron Cyclotron Resonance (ECR) Plasma assisted Chemical Vapor Deposition (CVD) technology has been used to prepare Si3N4 films, which were analyzed by using infrared (IR) transmission spectroscopy and XPS. The analysis results show that with the increase of the deposition temperature, the H content decreases, and the densification of the film increases.When the temperature is up to 360℃, the stoichiometrical rate of Si:N is close to 0.75. The protective property of Si3N4 films is also examined.
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机译:The Application of the Golden Gate Image in Film and Television Media in History Teaching: Taking the Film "Summer Concerto" as an Example =影视媒体中的金门意象在历史教学的运用--以电影《夏天协奏曲》为例