Present Status of EUV Interferometer Development at the Research Center for Soft X-ray Microscopy

摘要

A new interferometer for extreme ultraviolet (EUV) radiation with a laser produced plasma (LPP) laboratory source is under construction. The LPP source is operated with a Sn solid rod target on which pulsed YAG laser is focused to produce high temperature plasma emitting EUV radiation. The source is equipped with a newly designed debris stopper protecting a condenser multilayer mirror from the particle debris of the target. The condenser mirror focuses the light onto an EUV beam-splitter to form transmitted and reflected paths for producing interference fringes of a sharing type. The optical configuration is of a common path based on a triangular path type with a focusing at the beam-splitter, which is enabled to produce fringes by a low coherence radiation with a standard optical quality beam-splitter. The fringes are recorded by an imaging plate with pixels as small as 25μm. The dynamic range of linearity in detection of the EUV light was found to be more than 104 with sensitivity of 104 photons/pixel, enough for the purpose of interferogram recording, possibly with one laser shot.