为了研究157nm激光工艺参量对刻蚀件能的影响,采用157nm深紫外激光对两种宽禁带材料(石英玻璃和蓝宝石)进行微刻蚀试验,得到了理想的工艺参量范围,蓝宝石的刻蚀速率大约是石英玻璃的一半,并且蓝宝石的刻蚀表面要比石英玻璃粗糙得多.随着刻蚀深度的增加,光解生成物的脱出变得困难,从而导致刻蚀速率的降低.选用较高的扫描速率和较低脉冲频率的组合进行激光扫描刻蚀能有效地降低刻蚀面的粗糙度.结果表明,对非金属材料的刻蚀,激光的能量密度在材料刻蚀阈值的2.5倍～4倍时能获得较好的刻蚀效果.%To investigate the effect of 157nm laser parameters on the ablation performance, two wide hand-gap materials (fused silica and sapphire) were employed in 157nm laser micromachining experiments, and ideal parameter range of laser process was obtained. The ablation rate of sapphire is approximately half of that of fused silica, and the ablated surface of sapphire is much rougher than that of fused silica. With the increase of etching depth, the generated particles are difficult to escape from microstructures so that the ablation rate decreases. For laser scanning, higher velocity and lower pulse repetition rate are favorable for reducing the surface roughness. Experimental results show that, for the etching of nonmetal materials, the laser fluence should be controlled 2.5 times～4 times of energy threshold of the ablated material, so as to get better etching effect.
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