Laser micromachining of optical materials with a 157nm fluorine laser

摘要

Vacuum UV laser micromachining is used to produce microstructures in common photonics materials. The ablation etch rates of lithium niobate, fused silica and indium phosphide are measured at 157nm and angled facets and v-grooves are machined into the materials using a high NA mask projection system. The applicability of such micromachined structures for photonics devices is discussed and future developments outlined.