为获取纳米压痕测试装置的机架柔度,分析了Doerner-Nix、Oliver-Pharr、Sun Yong、Van Vliet等几种机架柔度标定方法,并在Van Vliet方法的基础上,提出了一种直接标定纳米压痕测试装置机架柔度的改进方法.该方法在已有测试装置基础上只需用平头圆棒替换原有压头即可实现对测试装置机架柔度的标定,标定过程接近装置实际工作状态,保证了标定结果的可用性.利用此改进方法标定得到了自主研制的纳米压痕测试装置的机架柔度值为0.00794 mm/N,标定结果与通过Sun Yong方法得到的结果基本一致,说明了改进方法的可信性.提出的改进方法可方便、快速地对纳米压痕测试装置机架柔度进行标定,也可以扩展用于标定其他精密仪器装备的机架柔度.%To obtain frame compliance of nanoindentation instruments, several calibration methods,such as Doerner-Nix method, Oliver-Pharr method, Sun Yong method and Van Vliet method are reviewed and analyzed. Following Van Vliet method, an improved one to directly calibrate frame compliance of nanoindentation instrument is proposed. Taking a round rod with flat end instead of the indenter, it can be realized to calibrate frame compliance near the working condition of nanoindentation instruments. The improved method enables to calibrate frame compliance of a self-made nanoindentation instrument as 0. 007 94 mm/N, which coincides with that obtained by Sun Yong method. It can also be extended to calibrate compliance frame of other precise instruments and devices.
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