网格掩膜技术消除激光脉冲沉积中的大颗粒

摘要

研究了PLD过程大颗粒的产生机制,它是由靶材表面下部的潜热和羽辉的传输产生的.通过在靶和基片间放入一个尺寸和位置都合适的网格掩膜,用它来过滤从靶材溅射出来的大颗粒.沉积好的薄膜用XRD、SEM和AFM方法表征.相对于传统方法制备出的样品,我们得到了高平整性的薄膜并且导致薄膜粗糙的大颗粒非常有效地被网格掩膜抑制住了.%We investigated the mechanism of large-particles produced in the depositing process of PLD(pulsed laser deposition) due to the latent heat below the surface target and the transmission of the plasma plume. By adding a grid-mask with suitable size and location between the substrate and the target to block the large particles radiated from the target. The films were characterized by the XRD, SEM and AFM measurement methods. We obtained high-quality films with optimistic surface morphology compared to traditional method. The large particles, which result in a very rough surface could be effectively suppressed via the adding a grid-mask.