In this paper , TiAlN film was prepared by using medium frequency twin magnetron sputtering technology and adjusting the size of the substrate negative bias in the process of thin film deposition with Q235 carbon steel as matrix .Atomic force microscope ( AFM) were used to observe surface morphology , and potentiodynamic polarization test were carried out to study film for electrochemical corrosion form , by steps, and microhardness meter measuring film thickness and hardness , using X-ray photoelectron spectrometer test film organization composition .The results showed that TiAlN film surface was smooth , and the roughness was low.Along with the increase of bias , the film thickness , microhardness and corrosion resist-ance were presented first , after the trend of decrease .When negative bias increased to 60 V, thin film of corrosion potential and corrosion current density was respectively 256 .2 mV and 7.81 ×10 -6 A/cm2 , and the corrosion resistance was maximum .X-ray photoelectron spec-troscopy ( XPS) test results showed that along with the increase of negative bias picture , Al/Ti ratio decreased .%采用中频孪生磁控溅射技术，以Q235碳钢为基体，通过调整薄膜沉积过程中基体负偏压大小，制备TiAlN薄膜．采用原子力显微镜（ AFM）观察薄膜表面形貌，采用动电位极化试验研究薄膜的电化学腐蚀行为，用台阶仪和显微硬度计测量薄膜的厚度和硬度，用X-射线光电子能谱仪测试薄膜的组织成分．结果表明，TiAlN薄膜表面平整，粗糙度低．随偏压的增大，膜厚、显微硬度和耐腐蚀性都呈现也先增大，后减小的趋势．当负偏压增大到60 V时，薄膜的腐蚀电位和腐蚀电流密度分别为-256．2 mV和7．81×10-6 A/cm2，抗腐蚀能力最强．X射线光电子能谱（ XPS）检测结果表明，随负偏压幅的增大，Al/Ti原子比降低．
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