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非制冷红外探测器夹层厚膜工艺及介电性能研究

         

摘要

以钡、锶和锰醋酸盐为原料,采用新型溶胶-凝胶法制备锰掺杂4%mol、Ba/Sr分别为60/40、65/35和70/30的纳米粉体,均匀分散于组分相同的BST溶胶中,形成稳定的厚膜先体凝胶.浓度0.4mol/L钛酸钡凝胶薄膜种子层,作为不同组分厚膜之间的中间夹层.利用旋转涂覆工艺在LNO/Pt/Ti/SiO2/Si复合底电极上,制备出厚度约为6~10μm的BST介电增强型夹层厚膜.XRD测试结果表明,650℃热处理2h后的夹层厚膜为单一钙钛矿相,750℃热处理后2h的夹层厚膜在室温、环境温度25℃、频率1kHz下相对介电常数εγ和介质损耗tanδ分别约为1200和0.03,室温25℃附近较宽范围介温变化率>1.2%/℃,BST夹层厚膜无裂纹出现,表面平整,致密,是制备大阵列非制冷红外焦平面阵列(UFPA)的优选材料.%The stable precursor gel of thick film is formed by uniform dispersion of nano-powder into the BST sol. The nano-powder is obtained by a new sobgel method by means of 4mol% Mn doping,with Ba,Sr and man-ganese acetate as raw materials. In addition, Ba/Sr ratio is 60/40,65/35 and 70/30, respectively. The BST thin film of with 0.4mol/L concentration is used to be the interlining between the thick films with different compo-nents. The BST dielectric-reinforced interlining thick film of around 6-10μm thickness is made in the composite LNO/Pt/Ti/SiO2/Si bottom electrode by spin-coating process. The XRD measurement shows that the interlin-ing thick film by 2h heating treatment at 650℃ is a single perovskite phase. The relative dielectric constant εγand dielectric loss tan δ of the interlining thick film by two-hour heating treatment at 700℃ are approximately 1200 and 0. 03 in the case of 25℃ and lkHz, respectively. The dielectric-temperature change rate is over 1.2%/℃ within a wide range near 25℃. The surface of BST interlining thick film is very smooth and compact without any fracture. Thus, the BST interlining thick film is seen as the preferable material for large UFPA.

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