首页> 外文会议>Conference on Infrared Detectors and Focal Plane Arrays VII, Apr 2-3, 2002, Orlando, USA >A Low-Cost Small Pixel Uncooled Infrared Detector for Large Focal Plane Arrays using a Standard CMOS Process
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A Low-Cost Small Pixel Uncooled Infrared Detector for Large Focal Plane Arrays using a Standard CMOS Process

机译:采用标准CMOS工艺的大型焦平面阵列的低成本小像素非制冷红外探测器

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This paper reports the development of a low-cost, small pixel uncooled infrared detector using a standard CMOS process. The detector is based on a suspended and thermally isolated p~+-active-well diode whose forward voltage changes due to an increase in the pixel temperature with absorbed infrared radiation. The detector is obtained with simple post-CMOS etching steps on dies fabricated using a standard n-well CMOS process. The post-CMOS process steps are achieved without needing any deposition or lithography, therefore, the cost of the detector is almost equal to the cost of the fabricated CMOS chip. Before suspending the pixel using electrochemical etch-stop technique in TMAH, the required etch openings to reach the silicon substrate are created with a simple dry etch process while CMOS metal layers are used as protection mask. Since the etch mask is implemented with available CMOS layers, the etch openings can be reduced significantly, allowing to implement small pixel sizes with reasonable fill factor. This approach is used to implement a 40μmX40μm diode pixel with a fill factor of 44%, suitable for large format FPAs. The p~+-active-well diode has a low 1/f noise, due to its single crystal nature and low bias requirement. Optimum pixel performance is achieved when the pixel is biased at 20μA, where self-heating effect is less than 0.5K. Measurements and calculations show that this new detector has a thermal conductance (G_(th)) of 1.4X10~(-7)W/K and provides a responsivity (R) of 5800V/W and a detectivity (D~*) value of 1.9Xl0~9cm(Hz/W)~(1/2) when scanned at 30fps with an electrical bandwidth of 4kHz. If this detector is used to implement a 64x64 or 128x128 FPA with sufficient number of parallel readout channels, these FPAs will provide an NETD value of 195mK considering only the detector noise. When the readout noise is included, these FPAs are expected to provide NETD value below 300mK. Such FPAs are very suitable for ultra low-cost infrared imaging applications.
机译:本文报道了使用标准CMOS工艺开发的低成本,小像素非制冷红外探测器的开发。该检测器基于一个悬浮且热隔离的p〜+有源/ n阱二极管,其正向电压由于像素温度随吸收的红外辐射而升高而改变。该检测器是通过使用标准n阱CMOS工艺制造的管芯上的简单CMOS后蚀刻步骤获得的。无需任何沉积或光刻即可完成CMOS后工艺步骤,因此,检测器的成本几乎等于制造的CMOS芯片的成本。在TMAH中使用电化学蚀刻停止技术来悬挂像素之前,通过简单的干法蚀刻工艺创建到达硅衬底所需的蚀刻开口,同时将CMOS金属层用作保护掩模。由于蚀刻掩模是通过可用的CMOS层实现的,因此可以大大减少蚀刻开口,从而以合理的填充系数实现小像素尺寸。该方法用于实现40μmX40μm的二极管像素,其填充系数为44%,适用于大幅面FPA。 p〜+有源/ n阱二极管由于其单晶性质和低偏置要求而具有低的1 / f噪声。当像素偏置在20μA时,自发热效应小于0.5K,可获得最佳的像素性能。测量和计算表明,该新型探测器的热导率(G_(th))为1.4X10〜(-7)W / K,响应度(R)为5800V / W,探测度(D〜*)为当以30kHz的频率和4kHz的电气带宽扫描时为1.9Xl0〜9cm(Hz / W)〜(1/2)。如果此检测器用于实现具有足够数量的并行读取通道的64x64或128x128 FPA,则这些FPA将仅考虑检测器噪声即可提供195mK的NETD值。当包括读出噪声时,这些FPA有望提供低于300mK的NETD值。这种FPA非常适合超低成本红外成像应用。

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