致密ZnO薄膜的电化学制备及光学性能研究

摘要

A compact thin ZnO film was fabricated on ITO conductive glass by electrochemical deposition method.The surface topography and thickness of thin ZnO film fabricated under different mass fraction of electrolyte,voltage and time was characterized by SEM.It is demonstrated that when the mass fraction of electrolyte,voltage and time is 1.2%,1.0V and 60s,respectively,the ZnO film is compact and the thickness is just 120nm,and the transmission in visible band is higher than 50%,providing the basis for the application of thin ZnO film in multilayer optical metamaterials.%采用电化学沉积法在ITO导电玻璃上沉积1层致密的ZnO薄膜。用扫描电镜（SEM）对在不同电解液浓度、电压和时间下制备的ZnO薄膜的表面形貌作了表征,并观测了ZnO薄膜的厚度,结果表明当电解液的质量分数为1.2%,电压为1.0V,时间为60s时,制备的ZnO薄膜致密且厚度仅为120nm,利用分光光度计测得ZnO薄膜在可见光波段的透射率高于50%,为ZnO薄膜在多层光学超材料中的应用奠定了基础。