首页> 中文期刊> 《陶瓷学报》 >常压烧结制备氧化钨陶瓷靶材的致密化研究

常压烧结制备氧化钨陶瓷靶材的致密化研究

         

摘要

The WO3 ceramic targets with high purity and high density were prepared by pressuretess sintering. The effects of powder size, molding pressure, sintering temperature and soaking time on the density of the target were studied. The results show WO3 ceramic target with high purity and high density can be prepared as the powder size is 0.27um, the molding pressure is 60Mpa, the sintering temperature is 1200℃ and the soaking time is In. The WO, target has a single monoclinic phase.%采用常压固相烧结工艺,制备出高纯度、高致密度的氧化钨靶材.考察了粉体粒度、成型压强、烧结温度和保温时间等对靶材致密度的影响.测试结果表明,以粒度0.27μm的粉体为原料,成型压强为60MPa,烧结温度为1200℃,保温时间为lh的条件下,可以制备出高致密度的氧化钨靶材,其组成为高纯的单斜晶相.

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