大口径反射元件环形抛光工艺

摘要

The paper investigates the annular lapping process of large-aperture reflective component. A 610 mm×440 mm× 85 mm reflective component was processed by a lapping machine with a 4 m-diameter lapping disk. In order to improve the surface flatness of the optical component, the rotating speeds and locations of the conditioner and the workpiece ring, and the groove shape on the asphalt plate were optimized. The surface flatness converse more efficiently, with the best value of λ/6(λ = 632. 8 nm), after optimization. Thus annular lapping is suitable for processing large-aperture optical components.%根据环形抛光的加工特点,研究了大口径反射元件的环形抛光加工工艺.在4m环抛机上进行了610 mm×440mm×85 mm的大口径反射元件加工工艺实验,研究了修正盘及工件盘转速与元件面形的关系、修正盘及工件盘位置与元件面形的关系、沥青盘槽形与元件面形的关系.研究结果表明,通过对修正盘及工件盘转速、修正盘及工件盘位置、沥青盘槽形等工艺参数的优化控制,能够得到大口径反射元件面形的高效收敛,元件最高面形精度优于λ/6(λ =632.8 nm),验证了加工工艺的有效性.