传统的太阳能电池扩散工艺采用常压扩散，随着高效晶硅电池的发展，扩散结深的不断变浅，常压扩散已难以满足晶体硅太阳能电池高效、低成本发展的技术要求。低压扩散通过在反应管内提供低压工艺环境，提升扩散制结的性能。对低压扩散机理进行了详细分析，从扩散分子自由程、掺杂原子分压比和气场均匀性等方面详细分析了低压扩散对高方阻均匀性的影响关系。采用新型低压扩散炉进行工艺实验测试，结果表明，低压扩散在可达到扩散方阻目标值110Ω时更好的均匀性，载片量较常压扩散大幅度提升，具有无可比拟的生产优势，是未来扩散技术的主要发展方向。%T he traditional solar cell diffusion process is atm ospheric. W ith the developm ent of efficient crystalline silicon,diffused junction depth becom es shallow ,atm ospheric diffusion has been difficult to m eet the industry dem and for high efficiency and low cost. L ow pressure diffusion furnace im proves the perform ance of diffused junction,through giving low pressure process environm ent in the reaction tube. In this paper,the low pressure diffusion m echanism is analyzed in detail from the follow ing severalaspects:m olecularfree path,im purity atom ratio,uniform ity ofthe aura and theirinfluence on the uniform ity ofhigh sheetresistance.The experim entresults show thatlow pressure diffusion process can achieve higher sheet resistance uniform ity at 110 ohm s and m ore loading quantity then atm ospheric diffusion furnace. So low pressure diffusion has incom parable advantages,it is the future m ain direction of diffusion technique.
展开▼
