Insights into the nucleation,grain growth and phase transformation behaviours of sputtered metastableβ-W films

摘要

Metastable phase in tungsten film is of great interests in recent years due to its giant spin Hall effects,however,little information has been known on its nucleation,growth and phase transformation.In this paper,a 900 nm-thick tungsten film with double-layer structure(α-W underlayer andβ-W above it)was produced on SiO_(2)/Si substrate by high vacuum magnetron sputtering at room temperature.The structural properties ofβ-W were systemically investigated by X-ray diffraction,transmission electron microscopy,thermodynamic calculation,first-principle and phase-field simulations.It is found that theβ-W nucleation is energetically favoured on the SiO_(2)surface compared to theα-W one.As the film thickening proceeds,β-W[211]turns to be preferred direction of growth owing to the elastic strain energy minimization,which is verified by phase-field simulations.Moreover,theβ→αphase transformation takes place near the film-substrate interface while the rest of the film keeps theβ-W phase,leading to a doublelayer structure.This localized phase transition is induced by lower Gibbs free energy ofα-W phase at larger grain sizes,which can be confirmed by thermodynamic calculation.Further in-situ heating TEM analysis of the as-deposited film reveals that theβ→αphase transformation is fulfilled byα/βinterface propagation rather than local atomic rearrangements.Our findings offer valuable insights into the intrinsic properties of metastable phase in tungsten.