Mylar膜衬底上的镀膜技术

摘要

The technology of depositing different material foils on Mylar films by vacu-um evaporation was systematically studied .The radiation heat from evaporation source and condensation heat of depositing ,w hich raise the temperature of the substrate in the process of depositing foils by vacuum evaporation ,were discussed in detail .An accurate method of controlling thickness was introduced . The homogeneity of depositing foils was calculated and measured for static substrate and rotating substrate ,respectively . Methods of preventing Mylar films from softening were explored and summarized .Two dozen kinds of material foils ,e .g .Sc ,Ti etc .,with thickness of 1 μg/cm2 and 20 μg/cm2 respectively deposited on 12.5 μm Mylar films were successfully prepared ,which are required by physics experiments .Finally ,the uniformity of Cu and Cr foils deposi-ted on Mylar films was measured by X-fluorometric analysis .Results show that the uni-formity is better than 5% ,w hich fully satisfies the requirement of physical experiment .%本文系统地研究了在M ylar膜上通过真空蒸发沉积各种不同材料薄膜的技术，详细讨论了真空蒸发沉积薄膜时使衬底温度升高的蒸发源的辐射热和沉积时的冷凝热，介绍了一种精确控制厚度的方法，分析了静止衬底和转动衬底沉积薄膜的均匀性，探索和总结了在M ylar膜衬底上镀膜过程中防止衬底软化的方法。在12.5μm厚的M ylar膜上成功沉积了厚度为1μg/cm2和20μg/cm2的Sc、T i等24种物理实验需要的薄膜。最后用X射线荧光分析方法测量了沉积在Mylar膜上的Cu膜和Cr膜的均匀性。结果显示，均匀性优于5％，完全满足物理实验的要求。