TiO2 nanoparticulate films were prepared by means of Plasma-enhanced Chemical Vapor Deposition （PECVD）. By further surface treatment by TiCl4 or O2 plasma, films with dif- ferent surface properties were obtained. It was found that treatment by TiCl4 plasma enhanced the amount of Ti3+ suiface state and Ti dislocation of the film, detected by the surface photovoltage spectroscopy, while O2 plasma surface treating enhanced its amount of O2 surface state. It was also indicated by the H2O adsorption experiment that film treated by O2 plasma had larger separation efficiency for photogenerated carriers than the one treated by TiCl4 plasma.
展开▼
