采用分子动力学方法研究了载能H同位素原子与石墨晶体碰撞的同位素效应.碳氢系统的强共价键作用和石墨层间的弱van der Waals力分别用REBO和Ito半经验势函数来描述.研究发现：随着入射原子质量的增加,上表面吸附几率和反射几率的峰值都会向高能区移动;相比于H,~2H入射原子,~3H入射原子具有较高的吸附几率—包括上表面吸附和内部吸附;穿透石墨晶体,~2H,~3H原子所需的能量较高;原子质量和原子入射能量都会影响入射粒子与不同石墨层之间的能量传递过程.这些结果对理解碳基材料的~3H滞留机制有重要意义.%Molecular dynamics simulation is applied to the investigation of the isotopic effects during a hydrogen isotope atom bombarding the crystalline graphite containing four graphene sheets. Both Brenner＇s reactive empirical bond order potential and Ito＇s interlayer intermolecular potential are adopted to represent ＂ABAB＂ stacking of graphite. The simulation results reveal that the mass of the incident species has a big influence on the absorption on and the reflection from the upside graphite surface, the peaks of which shift toward higher end side of incident energy as the mass increases. The absorption coefficient of the incident tritium is large, compared with that of the incident either hydrogen or deuterium. To penetrate the four- sheet graphite at some striking locations, deuterium and tritium need more kinetic energy. It is found that both the mass and the incident energy of the incident species affect the energy transfer to background substrate. These results would be important for understanding the tritium retention occurring in fusion devices.
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