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Glassy -- Electret Ferroelectric Random Access Memory (GeRAM)

机译:玻-驻极体铁电随机存取存储器(GeRAM)

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摘要

Ferroelectric memory devices based on polar polymers are currently the focus of multiple studies. In these devices, the program/erase of memory involves the physical rotation of dipoles by an applied electric field. In the common approach, to obtain fast programming speed the operating temperature needs to be well above the polymer glass transition temperature (Tg) because at temperatures below Tg the dipoles are locked in place. However, fast programming achieved this way means the dipole are easy to rotate, leading to a short retention time.;In this dissertation, we demonstrate a radically new ferroelectric memory device concept based on polar polymers with Tg well above operation temperature. To achieve fast programming, we momentarily elevate the local temperature to well above Tg while applying a programming electric field. At the normal operation temperature, well below Tg, the dipoles are locked in their position. Neither depolarization field nor READ operation can disturb the memory state. This dual-condition programming (temperature and electric field) with long retention time is demonstrated using a thin-film ferroelectric field effect transistor (FeFET) with LaRC-CP1 polyimide (Tg ≈ 265 °C) gate dielectric (≈15 nm) and a doped polysilicon (≈15 nm) channel. Retention of the memory states with different programming conditions is studied. This new promising memory technology can lead to a universal memory with arbitrary number of memory states that exhibit extremely long retention times and are immune to depolarization fields, while using low cost processing materials that are CMOS compatible and highly scalable.
机译:目前,基于极性聚合物的铁电存储器件是众多研究的重点。在这些设备中,存储器的编程/擦除涉及偶极子通过施加电场的物理旋转。在通用方法中,为了获得快速的编程速度,工作温度必须远高于聚合物玻璃化转变温度(Tg),因为在低于Tg的温度下,偶极子会锁定在适当的位置。然而,以这种方式实现的快速编程意味着偶极子易于旋转,从而缩短了保留时间。在本论文中,我们演示了一种基于Tg远高于工作温度的极性聚合物的全新铁电存储器件概念。为了实现快速编程,我们在施加编程电场的同时将局部温度瞬间升高到远高于Tg。在正常工作温度(远低于Tg)下,偶极子被锁定在其位置。去极化场和读取操作都不会干扰存储器状态。使用带有LaRC-CP1聚酰亚胺(Tg≈ 265°C)栅极电介质(≈ 15 nm)的薄膜铁电场效应晶体管(FeFET)演示了具有长保留时间的这种双重条件编程(温度和电场)和掺杂的多晶硅(≈ 15 nm)通道。研究了不同编程条件下存储状态的保持情况。这种新的有前途的存储器技术可以导致具有任意数量的存储器状态的通用存储器,该存储器状态具有极长的保留时间,并且不受去极化场的影响,同时使用兼容CMOS且高度可扩展的低成本处理材料。

著录项

  • 作者

    Georgiou, Vasileia.;

  • 作者单位

    George Mason University.;

  • 授予单位 George Mason University.;
  • 学科 Electrical engineering.
  • 学位 Ph.D.
  • 年度 2017
  • 页码 149 p.
  • 总页数 149
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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