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Flip chip and heat spreader attachment development.

机译:倒装芯片和散热器附件开发。

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摘要

Flip chip packages offer many advantages over traditional wire bonding based packages. Flip chip packages have high input/output (I/O) handling capability, better electrical performance and smaller size. Proper package design, assembly materials and process integration are needed to build a reliable flip chip package. To reduce package cost, solders are typically used for flip chip interconnection, thus solder joint reliability is critical for flip chip package product application.;Part one of this dissertation was to study the impact of a small amount of Ni on lead free flip chip solder joint thermal shock reliability. Two groups of substrates were used in this study: solder (Sn/1%Ag/0.5%Cu) on pad (as reference) and Sn finished pad bumped with a Ni containing solder (Sn/1%Ag/0.5%Cu/0.05%Ni). Flip chip die bumped with SnAg eutectic solder was used for assembly on the two groups of substrates. The bumped die assembly on bumped (dome shape) substrate was successfully demonstrated. Assembled package thermal shock reliability test and failure analysis were performed. It was found that the small amount of Ni from the bumping solder paste was concentrated at the substrate site intermetallic (IMC) layer forming (Ni ∼ 1At%, Cu)6Sn5, but this did not impact the solder joint thermal shock reliability significantly.;Part two of this dissertation was to study metallization and indium solder based heat spreader attach for flip chip in package applications. For metallization stack selection, it is commonly believed that during soldering and the following solder joint service life time, the solder materials should not consume the underling metallization, otherwise, dewetting or severe solder joint reliability degradation will typically occur, thus a minimum thickness of a barrier metal beneath top anti-oxidization layer (Au typically) is typically used. Ti/Ni/Au flip chip die backside metallization was evaluated in our team before. The Ni layer was used as a barrier metal and the resulting indium solder joint had good reliability. In this study, Ti/Au thin film metallization without the Ni barrier was studied. It was found that the Au thin film was converted to AuIn2 IMC completely during soldering and there was no IMC formation between the In and Ti, however, the indium solder attachment had significant shear and pull strength. The attachment strength was not degraded by multiple lead free reflow or thermal aging testing.;Ti/Au (2000 A) die based heat spreader attach (24mm x 24mm Cu on 22mm x 22mm Si) showed early delamination compared with Ti/Ni/Au die based assembly after thermal shock cycle testing. The Au thin film thickness effect was further evaluated. The next round assembly with Ti/Au (3000 A) die did not show early delamination and had similar multiple reflow, thermal aging and thermal shock cycle reliability with Ti/Ni/Au die. The lower shear strength for Ti/Au (2000 A) based assembly was correlated to its early failure, since during thermal shock cycle testing, the joint was in shear stress.;Part three of this dissertation was to evaluate adhesive material based heat spreader attach for medium power application. A flat heat spreader was selected for cost reduction. A thermally conductive silicone was used as the thermal interface material. Another co-cure-able non-thermally conductive silicone was applied between the substrate and the heat spreader as a mechanical reinforcement. The manufacturing process was developed and the resulting structure was subjected to sequential assembly and environmental reliability tests. There was no interfacial delamination and no significant pull strength degradation after sequential stress testing.
机译:与传统的基于引线键合的封装相比,倒装芯片封装具有许多优势。倒装芯片封装具有很高的输入/输出(I / O)处理能力,更好的电气性能和更小的尺寸。需要正确的封装设计,组装材料和工艺集成,以构建可靠的倒装芯片封装。为了降低封装成本,焊料通常用于倒装芯片互连,因此焊点可靠性对于倒装芯片封装产品的应用至关重要。本论文的一部分是研究少量镍对无铅倒装芯片焊料的影响。联合热冲击可靠性。本研究使用了两组基板:焊盘上的焊料(锡(Sn / 1%Ag / 0.5%Cu)(作为参考)和锡处理过的焊盘被含镍焊料(Sn / 1%Ag / 0.5%Cu / 0.05)撞击%你)。带有SnAg共晶焊料的倒装芯片管芯用于在两组基板上进行组装。成功地证明了在凸起(圆顶形状)基板上的凸起模具组件。进行了组装后的包装的热冲击可靠性测试和故障分析。已经发现,从隆起的焊锡膏中产生的少量Ni集中在形成基体金属间(IMC)层(Ni〜1At%,Cu)6Sn5的位置,但这并没有显着影响焊点的热冲击可靠性。本文的第二部分是研究封装应用中倒装芯片的金属化和基于铟锡焊料的散热器连接。对于金属化叠层的选择,通常认为,在焊接及随后的焊点使用寿命期间,焊锡材料不应消耗底层金属,否则,通常会发生去湿或严重的焊点可靠性下降,因此最小厚度为通常使用顶部抗氧化层(通常为Au)下面的阻挡金属。 Ti / Ni / Au倒装芯片裸片背面金属化在我们的团队中进行过评估。 Ni层用作阻挡金属,并且所得的铟焊料接头具有良好的可靠性。在这项研究中,研究了没有Ni阻挡层的Ti / Au薄膜金属化。发现在焊接过程中,Au薄膜已完全转化为AuIn2 IMC,而In和Ti之间没有形成IMC,但是,铟焊料的附着力却很大。多次无铅回流或热老化测试不会降低连接强度。;与Ti / Ni / Au相比,基于Ti / Au(2000 A)裸片的散热器连接件(22mm x 22mm Si上的24mm x 24mm Cu)显示出早期分层。经过热冲击循环测试后的基于芯片的组装。进一步评价了Au薄膜厚度的影响。下一个带有Ti / Au(3000 A)模具的圆形组件未显示早期分层,并且与Ti / Ni / Au模具具有相似的多次回流,热老化和热冲击循环可靠性。 Ti / Au(2000 A)基组件的较低剪切强度与其早期失效有关,因为在热冲击循环测试期间,接头处在剪切应力下。论文的第三部分是评估基于粘合剂的散热器连接适用于中功率应用。选择了扁平散热器以降低成本。导热硅酮用作热界面材料。将另一种可共固化的非导热有机硅作为机械增强材料施加在基板和散热器之间。开发了制造工艺,并对所得结构进行了顺序组装和环境可靠性测试。在连续的应力测试后,没有界面分层,也没有明显的抗拉强度降低。

著录项

  • 作者

    Li, Yuquan.;

  • 作者单位

    Auburn University.;

  • 授予单位 Auburn University.;
  • 学科 Engineering Electronics and Electrical.
  • 学位 Ph.D.
  • 年度 2009
  • 页码 118 p.
  • 总页数 118
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 无线电电子学、电信技术;
  • 关键词

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