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Laser-fired contact formation on metallized and passivated silicon wafers under short pulse durations.

机译:在短脉冲持续时间内,在金属化和钝化的硅晶片上形成激光激发的接触。

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摘要

The objective of this work is to develop a comprehensive understanding of the physical processes governing laser-fired contact (LFC) formation under microsecond pulse durations. Primary emphasis is placed on understanding how processing parameters influence contact morphology, passivation layer quality, alloying of Al and Si, and contact resistance. In addition, the research seeks to develop a quantitative method to accurately predict the contact geometry, thermal cycles, heat and mass transfer phenomena, and the influence of contact pitch distance on substrate temperatures in order to improve the physical understanding of the underlying processes. Finally, the work seeks to predict how geometry for LFCs produced with microsecond pulses will influence fabrication and performance factors, such as the rear side contacting scheme, rear surface series resistance and effective rear surface recombination rates.;The characterization of LFC cross-sections reveals that the use of microsecond pulse durations results in the formation of three-dimensional hemispherical or half-ellipsoidal contact geometries. The LFC is heavily alloyed with Al and Si and is composed of a two-phase Al-Si microstructure that grows from the Si wafer during resolidification. As a result of forming a large three-dimensional contact geometry, the total contact resistance is governed by the interfacial contact area between the LFC and the wafer rather than the planar contact area at the original Al-Si interface within an opening in the passivation layer. By forming three-dimensional LFCs, the total contact resistance is significantly reduced in comparison to that predicted for planar contacts. In addition, despite the high energy densities associated with microsecond pulse durations, the passivation layer is well preserved outside of the immediate contact region. Therefore, the use of microsecond pulse durations can be used to improve device performance by leading to lower total contact resistances while preserving the passivation layer.;A mathematical model was developed to accurately predict LFC geometry over a wide range of processing parameters by accounting for transient changes in Al and Si alloy composition within the LFC. Since LFC geometry plays a critical role in device performance, an accurate method to predict contact geometry is an important tool that can facilitate further process development. Dimensionless analysis was also conducted to evaluate the relative importance of heat and mass transfer mechanisms. It is shown that convection plays a dominant role in the heat and mass transfer within the molten pool. Due to convective mass transfer, the contacts are heavily doped with Al and Si within 10 is after contact formation, which contributes to the entire resolidified region behaving as the electrically active LFC. The validated model is also used to determine safe operating regimes during laser processing to avoid excessively high operating temperatures. By maintaining processing temperatures below a critical temperature threshold, the onset of liquid metal expulsion and loss of alloying elements can be avoided. The process maps provide a framework that can be used to tailor LFC geometry for device fabrication.;Finally, using various geometric relationships for the rear side contacting scheme for photovoltaic devices, it is shown that by employing hemispherical contacts, the number of LFCs required on the rear side can be reduced 75% while doubling the pitch distance and increasing the passivation fraction. Reducing the number of backside contacts required can have a noteworthy impact of manufacturing throughput. In addition, the analytical models suggest that device performance can be maintained at levels comparable to those achieved for planar contacts when producing three-dimensional contacts. The materials and electrical characterization results, device simulations, and design considerations presented in this thesis indicate that by forming three-dimensional LFCs, performance levels of Si-based photovoltaic devices can be maintained while greatly enhancing manufacturing efficiency. The research lays a solid foundation for future development of the LFC process with microsecond pulse durations and indicates that device fabrication employing this method is a critical step moving forward.
机译:这项工作的目的是全面了解在微秒脉冲持续时间下控制激光烧结(LFC)形成的物理过程。主要重点放在理解加工参数如何影响接触形态,钝化层质量,Al和Si的合金化以及接触电阻。此外,该研究试图开发一种定量方法,以准确地预测接触几何形状,热循环,传热和传质现象以及接触间距对衬底温度的影响,从而提高对底层工艺的物理理解。最后,这项工作试图预测微秒脉冲产生的LFC的几何形状将如何影响制造和性能因素,例如背面接触方案,背面串联电阻和有效的背面复合率。; LFC横截面的表征揭示了微秒脉冲持续时间的使用会导致形成三维半球形或半椭圆形接触几何形状。 LFC与Al和Si高度合金化,并且由两相Al-Si微观结构组成,该组织在再固化过程中从Si晶片生长。由于形成了较大的三维接触几何形状,总接触电阻取决于LFC与晶片之间的界面接触面积,而不是钝化层中某个开口内原始Al-Si界面处的平面接触面积。通过形成三维LFC,与预计的平面接触相比,总接触电阻显着降低。另外,尽管与微秒脉冲持续时间相关联的能量密度很高,但钝化层仍被很好地保留在直接接触区域之外。因此,微秒脉冲持续时间的使用可通过降低总接触电阻并同时保留钝化层来改善器件性能。;建立了数学模型,通过考虑瞬态因素,可在广泛的工艺参数中准确预测LFC几何形状LFC中Al和Si合金成分的变化。由于LFC几何形状在设备性能中起着至关重要的作用,因此预测接触几何形状的准确方法是可以促进进一步工艺开发的重要工具。还进行了无量纲分析,以评估传热和传质机理的相对重要性。结果表明,对流在熔池内的传热和传质中起主要作用。由于对流传质,在触点形成后的10秒钟之内,触点就被Al和Si重掺杂,这有助于整个重新固化区域的电活性LFC。经过验证的模型还可以用于确定激光加工过程中的安全操作方案,以避免过高的操作温度。通过将加工温度保持在临界温度阈值以下,可以避免液态金属排出的开始和合金元素的损失。流程图提供了可用于定制LFC几何结构以进行器件制造的框架。最后,针对光伏器件的背面接触方案使用了各种几何关系,结果表明,通过采用半球形接触,所需的LFC数背面可以减少75%,同时使间距增加一倍并增加钝化率。减少所需的背面触点数量可能会对制造产能产生显着影响。此外,分析模型表明,器件的性能可以保持在与产生三维接触时平面接触所能达到的水平相当的水平。本文提出的材料和电学表征结果,器件仿真和设计考虑因素表明,通过形成三维LFC,可以保持Si基光伏器件的性能水平,同时大大提高了制造效率。该研究为具有微秒脉冲持续时间的LFC工艺的未来发展奠定了坚实的基础,并表明采用这种方法的器件制造是向前迈出的关键一步。

著录项

  • 作者

    Raghavan, Ashwin S.;

  • 作者单位

    The Pennsylvania State University.;

  • 授予单位 The Pennsylvania State University.;
  • 学科 Materials science.
  • 学位 Ph.D.
  • 年度 2014
  • 页码 212 p.
  • 总页数 212
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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