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Characterization of Oxide Thin Films and Interfaces Using Transmission Electron Microscopy.

机译:使用透射电子显微镜表征氧化物薄膜和界面。

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摘要

Multifunctional oxide thin-films grown on silicon and several oxide substrates have been characterized using High Resolution (Scanning) Transmission Electron Microscopy (HRTEM), Energy-Dispersive X-ray Spectroscopy (EDX), and Electron Energy-Loss Spectroscopy (EELS). Oxide thin films grown on SrTiO3/Si pseudo-substrate showed the presence of amorphised SrTiO3 (STO) at the STO/Si interface. Oxide/oxide interfaces were observed to be atomically clean with very few defects.;Al-doped SrTiO3 thin films grown on Si were of high crystalline quality. The Ti/O ratio estimated from EELS line scans revealed that substitution of Ti by Al created associated O vacancies. The strength of the crystal field in STO was measured using EELS, and decreased by ~1.0 eV as Ti4+ was substituted by Al3+. The damping of O-K EELS peaks confirmed the rise in oxygen vacancies. For Co-substituted STO films grown on Si, the EDS and EELS spectra across samples showed Co doping was quite random. The substitution of Ti4+ with Co3+ or Co2+ created associated oxygen vacancies for charge balance. Presence of oxygen vacancies was also confirmed by shift of Ti-L EELS peaks towards lower energy by ~0.4 eV. The crystal-field strength decreased by ~0.6 eV as Ti4+ was partially substituted by Co3+ or Co2+.;Spinel Co3O4 thin films grown on MgAl2O 4 (110) were observed to have excellent crystalline quality. The structure of the Co3O4/MgAl2O4 interface was determined using HRTEM and image simulations. It was found that MgAl 2O4 substrate is terminated with Al and oxygen. Stacking faults and associated strain fields in spinel Co3O4 were found along [111], [001], and [113] using Geometrical Phase Analysis.;NbO2 films on STO (111) were observed to be tetragonal with lattice parameter of 13.8 A and NbO films on LSAT (111) were observed to be cubic with lattice parameter of 4.26 A. HRTEM showed formation of high quality NbOx films and excellent coherent interface. HRTEM of SrAl4 on LAO (001) confirmed an island growth mode. The SrAl 4 islands were highly crystalline with excellent epitaxial registry with LAO. By comparing HRTEM images with image simulations, the interface structure was determined to consist of Sr-terminated SrAl4 (001) on AlO2-terminated LAO (001).
机译:使用高分辨率(扫描)透射电子显微镜(HRTEM),能量色散X射线光谱仪(EDX)和电子能量损失谱仪(EELS)对在硅和几种氧化物衬底上生长的多功能氧化物薄膜进行了表征。在SrTiO3 / Si伪基板上生长的氧化物薄膜表明在STO / Si界面处存在非晶态SrTiO3(STO)。观察到氧化物/氧化物界面是原子清洁的,几乎没有缺陷。;在Si上生长的Al掺杂的SrTiO3薄膜具有高结晶质量。根据EELS线扫描估计的Ti / O比表明,用Al替代Ti会产生相关的O空位。使用EELS测量了STO中的晶体场强度,由于Ti4 +被Al3 +替代,降低了约1.0 eV。 O-K EELS峰的阻尼证实了氧空位的增加。对于在Si上生长的Co取代的STO膜,样品的EDS和EELS光谱表明Co掺杂非常随机。用Co3 +或Co2 +替代Ti4 +会产生相关的氧空位,以实现电荷平衡。 Ti-L EELS峰向较低能量偏移约0.4 eV,也证实了氧空位的存在。当Ti4 +被Co3 +或Co2 +部分取代时,晶体场强度降低了约0.6 eV。观察到在MgAl2O 4(110)上生长的Spinel Co3O4薄膜具有优良的结晶质量。使用HRTEM和图像模拟确定了Co3O4 / MgAl2O4界面的结构。发现MgAl 2O4衬底被Al和氧终止。利用几何相分析法在[111],[001]和[113]上发现了尖晶石Co3O4中的堆垛层错和相关的应变场。;观察到STO(111)上的NbO2薄膜呈四方晶,晶格参数为13.8A和NbO观察到LSAT(111)上的薄膜呈立方晶格,晶格参数为4.26A。HRTEM显示形成了高质量的NbOx薄膜和出色的相干界面。老挝(001)上的SrAl4的HRTEM证实了一种岛生长模式。 SrAl 4岛是高度结晶的,与LAO具有极好的外延配准。通过将HRTEM图像与图像模拟进行比较,确定了界面结构由Al2终止的LAO(001)上的Sr终止的SrAl4(001)组成。

著录项

  • 作者

    Dhamdhere, Ajit.;

  • 作者单位

    Arizona State University.;

  • 授予单位 Arizona State University.;
  • 学科 Condensed matter physics.;Materials science.;Physics.
  • 学位 Ph.D.
  • 年度 2015
  • 页码 178 p.
  • 总页数 178
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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