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Materials research on metallized aluminum-nitride for microelectronic packaging.

机译:用于微电子封装的金属化氮化铝材料研究。

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The use of aluminum nitride as a substrate material for microelectronics is examined. A brief look at thermal, mechanical, and electrical properties of aluminum nitride show that it is a viable alternative material for this use. A study of the interfaces between aluminum nitride and several thick film pastes (palladium silver conductor, ruthenium oxide resistor, and gold conductor) was performed with optical microscopy, scanning electron microscopy, and energy dispersive spectroscopy. Results of this investigation showed that the contaminants in the substrate material that affect thermal conductivity do not affect the adhesion of the thick film pastes. However, it was found that the lack of certain elements in the binder of the thick film paste could lead to weaker adhesion, and severe degradation of the thick film's adhesion during thermal cycling.
机译:检验了氮化铝作为微电子学的衬底材料的用途。简要了解一下氮化铝的热,机械和电性能,可以发现氮化铝是一种可行的替代材料。用光学显微镜,扫描电子显微镜和能量色散光谱研究了氮化铝和几种厚膜浆料(钯银导体,氧化钌电阻和金导体)之间的界面。该研究的结果表明,基材材料中影响导热性的污染物不会影响厚膜浆料的附着力。然而,发现厚膜浆料的粘合剂中缺少某些元素会导致较弱的粘合性,并且在热循环过程中,厚膜的粘合性严重劣化。

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