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Electron transport in wide parabolic gallium arsenide/aluminum gallium arsenide wells.

机译:宽抛物线型砷化镓/砷化铝镓阱中的电子传输。

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摘要

This thesis presents an experimental study of electron transport in remotely-doped wide({dollar}>{dollar}2000 A) parabolic GaAs/Al{dollar}sb{lcub}rm x{rcub}{dollar}Ga{dollar}sb{lcub}rm 1-x{rcub}{dollar}As wells at low temperatures (to 50 mK) and in strong magnetic fields (to 11 T). Data from three samples are shown which demonstrate that the electron gas layers in these wells are wide (up to 2000 A), of variable width, have high mobilities (to {dollar}sim{dollar}3 {dollar}times{dollar} 10{dollar}sp5{dollar} cm{dollar}sp2{dollar}/V-s), and are of approximately uniform three-dimensional density n{dollar}sb{lcub}rm 3D{rcub}{dollar} {dollar}sim{dollar}1 {dollar}times{dollar} 10{dollar}sp{lcub}16{rcub}{dollar}cm{dollar}sp{lcub}-3{rcub}{dollar}. These data also demonstrate that the 3D densities obtainable are below the Mott critical density n{dollar}sb{lcub}rm c{rcub} sim{dollar} 1.5 {dollar}times{dollar} 10{dollar}sp{lcub}16{rcub}{dollar} cm{dollar}sp{lcub}-3{rcub}{dollar} for the metal-insulator transition in doped bulk n-type GaAs, making wide parabolic GaAs/Al{dollar}sb{lcub}rm x{rcub}{dollar}Ga{dollar}sb{lcub}rm 1-x{rcub}{dollar}As wells (WPBWs) an attractive system for observing electron-electron interactions at low densities.; The parabolic wells of the MBE-grown WPBW samples were grown by the digital alloy technique. A series of three samples was prepared with a range of 3D densities spanning the critical density n{dollar}sb{lcub}rm c{rcub}{dollar} for doped GaAs: n{dollar}sb{lcub}+{rcub}{dollar} = 2.5 {dollar}times{dollar} 10{dollar}sp{lcub}16{rcub}{dollar}cm{dollar}sp{lcub}-3{rcub}{dollar}, n{dollar}sb{lcub}+{rcub}{dollar} = 7 {dollar}times{dollar} 10{dollar}sp{lcub}15{rcub}{dollar}cm{dollar}sp{lcub}-3{rcub}{dollar}, and n{dollar}sb{lcub}+{rcub}{dollar} = 5 {dollar}times{dollar} 10{dollar}sp{lcub}15{rcub}{dollar}cm{dollar}sp{lcub}-3{rcub}{dollar}. The measured temperature dependences from 300 K to 4 K of the Hall sheet density and mobility for all three samples are very similar and show no qualitative changes with decreasing n{dollar}sb{lcub}+{rcub}{dollar}. The sheet densities are temperature-independent below T = 70 K and the mobilities {dollar}mu{dollar} all approach plateaus with {dollar}mu >{dollar} 2 {dollar}times{dollar} 10{dollar}sp5{dollar}cm{dollar}sp2{dollar}/V-sec below T {dollar}sim{dollar} 30 K. The T = 50 mK Shubnikov-de Haas (SdH) resistance oscillations in low transverse magnetic fields ({dollar}<{dollar}0.3 T) show structure due to multiple occupied subbands. Fourier transforms of the SdH data show well defined peaks which determine the subband sheet densities n{dollar}sb{lcub}rm si{rcub}{dollar} and the energy splittings E{dollar}sb{lcub}rm F{rcub}-{dollar}E{dollar}sb{lcub}rm i{rcub}{dollar}. These quantities agree well with self-consistent calculations for all three samples, evidence that the actual electron layer widths and 3D densities are close to the design values.; Preliminary magnetoresistance measurements with fields (0 to 11 T) applied in the plane of the electron layer and parallel (R{dollar}sb{lcub}rm par{rcub}{dollar}) or perpendicular (R{dollar}sb{lcub}rm perp{rcub}{dollar}) to the current are shown for two samples over the temperature range 0.42 K {dollar}<{dollar} T {dollar}<{dollar} 4.2 K. Near B {dollar}sim{dollar} 1 T we observe peaks in R{dollar}sb{lcub}rm par{rcub}{dollar} at the same field positions as dips in R{dollar}sb{lcub}rm perp{rcub}{dollar}. These features seem to correlate with the depopulation of the subbands but are not understood; a possible explanation is the formation of a spin density wave state, although a single particle explanation appears likely.
机译:本文提出了一种在远掺杂宽抛物面(2000美元)抛物线型GaAs / Al {dol} sb {lcub} rm x {rcub} {dollar} Ga {dollarssb { lcub} rm 1-x {rcub} {dollar}以及在低温(至50 mK)和强磁场(至11 T)下的阱。显示了来自三个样品的数据,这些数据表明这些井中的电子气层很宽(高达2000 A),宽度可变,具有较高的迁移率(达到{sim} {dollar} 3 {dollar} times {dollar} 10 {dollar} sp5 {dollar} cm {dollar} sp2 {dollar} / Vs),并且具有近似均匀的三维密度n {dollar} sb {lcub} rm 3D {rcub} {dollar} {dollar} sim {dollar } 1 {dollar} times {dollar} 10 {dollar} sp {lcub} 16 {rcub} {dollar} cm {dollar} sp {lcub} -3 {rcub} {dollar}。这些数据还表明,可获得的3D密度低于Mott临界密度n {dollar} sb {lcub} rm c {rcub} sim {dollar} 1.5 {dollar} times {dollar} 10 {dollar} sp {lcub} 16 { rcub} {dollar} cm {dollar} sp {lcub} -3 {rcub} {dollar}用于掺杂的块状n型GaAs中的金属-绝缘体过渡,使宽抛物线GaAs / Al {dollar} sb {lcub} rm x {rcub} {dollar} Ga {dollar} sb {lcub} rm 1-x {rcub} {dollar}井(WPBW)是一种有吸引力的系统,可在低密度下观察电子-电子相互作用。 MBE生长的WPBW样品的抛物线阱通过数字合金技术生长。制备了一系列三个样品,具有3D密度范围,涵盖掺杂GaAs的临界密度n {dollar} sb {lcub} rm c {rcub} {dollar}:n {dollar} sb {lcub} + {rcub} {美元} = 2.5 {美元}倍{美元} 10 {美元} sp {lcub} 16 {rcub} {美元} cm {dollar} sp {lcub} -3 {rcub} {dollar},n {dollar} sb {lcub } + {rcub} {dollar} = 7 {dollar} times {dollar} 10 {dollar} sp {lcub} 15 {rcub} {dollar} cm {dollar} sp {lcub} -3 {rcub} {dollar},和n {dollar} sb {lcub} + {rcub} {dollar} = 5 {dollar} times {dollar} 10 {dollar} sp {lcub} 15 {rcub} {dollar} cm {dollar} sp {lcub} -3 { rcub} {dollar}。三个样品的霍尔片密度和迁移率从300 K到4 K的实测温度依赖性非常相似,并且随着n {dollar} sb {lcub} + {rcub} {dollar}的降低,没有显示出质的变化。薄层密度在T = 70 K以下与温度无关,并且迁移率{dollar} mu {dollar}都接近高原,其中{dollar} mu> {dollar} 2 {dollar} times {dollar} 10 {dollar} sp5 {dollar}低于T {dollar} sim {dollar} 30 cm时的cm {dollar} sp2 {dollar} / V-sec。在低横向磁场中,T = 50 mK Shubnikov-de Haas(SdH)电阻振荡({dollar} <{dollar } 0.3 T)由于多个占用的子带而显示了结构。 SdH数据的傅立叶变换显示定义明确的峰,这些峰确定子带表密度n {dollar} sb {lcub} rm si {rcub} {dollar}和能量分裂E {dollar} sb {lcub} rm F {rcub}- {dollar} E {dollar} sb {lcub} rm i {rcub} {dollar}。这些数量与所有三个样品的自洽计算吻合得很好,证明了实际的电子层宽度和3D密度接近设计值。在电子层的平面中施加且平行(R {dollar} sb {lcub} rm par {rcub} {dollar})或垂直(R {dollar} sb {lcub})的场(0至11 T)的初步磁阻测量显示了在温度范围0.42 K时的两个样本的电流均方根值(rcub} {美元}){K}(美元)<{美元} T {美元} <{美元} 4.2K。B附近{美元} sim {美元} 1 T我们观察到R {dollar} sb {lcub} rm par {rcub} {dollar}中的峰值与R {dollar} sb {lcub} rm perp {rcub} {dollar}中的谷值在相同的场位置。这些特征似乎与子带的减少有关,但未被理解。可能的解释是自旋密度波状态的形成,尽管可能出现单个粒子的解释。

著录项

  • 作者

    Hopkins, Peter Farrell.;

  • 作者单位

    Harvard University.;

  • 授予单位 Harvard University.;
  • 学科 Physics Condensed Matter.; Engineering Electronics and Electrical.
  • 学位 Ph.D.
  • 年度 1990
  • 页码 265 p.
  • 总页数 265
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 无线电电子学、电信技术;
  • 关键词

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