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Microstructure and mechanical properties of electroless copper and their influence on the reliability of printed-circuit boards.

机译:化学镀铜的微观结构和机械性能及其对印刷电路板可靠性的影响。

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摘要

The microstructure and mechanical properties of copper deposits used in printed-circuit boards were investigated. The addition of surfactant and stabilizers in the electroless copper plating bath, effectively changed the fine-grained structure obtained from an additive-free bath to a columnar-grain structure. The shape, size and concentration of hydrogen voids on the grain boundaries are also affected by the additives in the plating bath. A comparison of the mechanical properties of commercial and in-house electroless copper deposits indicates that the ductility and tensile toughness of these deposits tested at room temperature can discriminate their behaviors in the Military Float-Solder Test. A minitensile tester was modified for the testing at elevated temperatures. Electroplated copper showed a brittle zone at temperatures higher than 150 centigrade. This brittle zone is similar to that of bulk Tough Pitch copper. However, electroless copper deposits showed an improvement in ductility at elevated temperature. Grain-boundary cracking was observed in electroplated copper tested at elevated temperatures compared to ductile fracture of electroless copper tested under the same conditions. Similarly, dynamic recrystallization is inhibited in the electroplated copper compared to grain growth in the electroless copper deposits. The lack of brittle zone in electroless copper deposits is attributed to the reduction of oxide by co-deposited hydrogen. A thermo-elastic-plastic finite element analysis of the thermal stresses at plated-through-holes in printed-circuit boards was conducted using the measured mechanical properties. The simulation showed that high-toughness electroless copper would pass the Float-Solder Test in agreement with the experimental results. Electroplated copper behaved poorly in a simulation of the Military Thermal-Cycling Test due to its brittle zone at elevated temperatures.
机译:研究了用于印刷电路板的铜沉积物的微观结构和力学性能。在化学镀铜浴中添加表面活性剂和稳定剂,可以有效地将无添加剂浴中的细颗粒结构变为柱状颗粒结构。晶界上氢空洞的形状,大小和浓度也受镀浴中添加剂的影响。商业和室内化学镀铜的机械性能比较表明,在室温下测试的这些镀层的延展性和拉伸韧性可以区分其在军事浮法-焊料测试中的行为。修改了微型测试仪,以在高温下进行测试。电镀铜在高于150摄氏度的温度下显示出脆性区。该脆性区与散装的硬节距铜区相似。然而,化学铜沉积物在高温下显示出延展性的改善。与在相同条件下测试的化学镀铜的延性断裂相比,在高温下测试的电镀铜观察到晶界裂纹。类似地,与化学镀铜沉积物中的晶粒生长相比,电镀铜抑制了动态再结晶。化学镀铜中缺乏脆性区的原因是共沉积氢减少了氧化物。使用所测量的机械性能对印刷电路板上镀通孔处的热应力进行了热弹塑性有限元分析。仿真表明,高韧性化学铜将通过浮法焊锡测试,与实验结果相符。电镀铜在军事热循环测试的模拟中表现不佳,原因是其在高温下的脆性区。

著录项

  • 作者

    Lin, Kuanchih.;

  • 作者单位

    Stevens Institute of Technology.;

  • 授予单位 Stevens Institute of Technology.;
  • 学科 Engineering Materials Science.; Engineering Electronics and Electrical.
  • 学位 Ph.D.
  • 年度 1990
  • 页码 251 p.
  • 总页数 251
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料学;无线电电子学、电信技术;
  • 关键词

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