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Carrier transport properties and reliability issues in flash EEPROM cells.

机译:闪存EEPROM单元中的载流子传输特性和可靠性问题。

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摘要

Flash memory has become the mainstream non-volatile memory. The NOR-type stacked-gate flash cells use channel hot electron injection and Fowler-Nordheim (F-N) tunneling for the programming operation and the erasing operation, respectively. As the feature sizes of the flash cells continue to scale down, other carrier transport mechanisms, such as Drain-Avalanche Hot Carrier (DAHC) injection, Substrate-Current-Induced Hot Electron (SCIHE) injection and oxide direct tunneling, become more important. With hot carrier injection and oxide tunneling as the carrier transport mechanisms, the flash cells are subjected to various device reliability issues, such as the wide cell threshold voltage distribution due to the over-erasure phenomena and device degradation due to hot hole injection.; This work is an attempt to investigate the carrier transport properties and reliability issues within the flash cells. To study the characteristics of ultra-low hot carrier injection, a floating gate extraction technique based on a lumped circuit model has been developed. To accurately model the oxide tunneling mechanism, the quantization effects have been taken into account by developing a simulator, MIS2D, and then evaluating the "effective" dielectric thickness and deeper band bending within Si substrates due to the quantization phenomena. The threshold voltage shifts due to quantization effects are also simulated using MIS2D. F-N tunneling and oxide direct tunneling have been simulated and then verified by electrical characterization with quantization effect correction. DAHC injection and SCIHE injection have been modeled and compared with experimental data. Both the DAHC injection and the SCIHE injection mechanisms have been applied to the convergence schemes, which are used to converge the wide cell threshold voltage distribution. The principle of the convergence operations has been analyzed and two design guidelines have been established. Compared to the DAHC scheme, the newly proposed SCIHE scheme can significantly improve the overall performance and long term reliability of the convergence operations and can be further optimized for block convergence.
机译:闪存已成为主流的非易失性存储器。 NOR型堆叠栅闪存单元分别使用沟道热电子注入和Fowler-Nordheim(F-N)隧穿来进行编程操作和擦除操作。随着闪存的特征尺寸不断缩小,其他载流子传输机制(例如漏极-雪崩热载流子(DAHC)注入,衬底电流感应热电子(SCIHE)注入和氧化物直接隧穿)变得越来越重要。以热载流子注入和氧化物隧穿作为载流子传输机制,闪存单元面临各种器件可靠性问题,例如由于过度擦除现象导致的宽单元阈值电压分布以及由于热空穴注入而引起的器件退化。这项工作是试图调查闪存单元内的载流子传输特性和可靠性问题。为了研究超低热载流子注入的特性,已经开发了基于集总电路模型的浮栅提取技术。为了精确地模拟氧化物隧穿机制,已通过开发模拟器MIS2D并考虑了量化效应,然后评估了“有效”介电层厚度以及由于量化现象而导致的Si基板内部较深的能带弯曲。还使用MIS2D模拟了由于量化效应引起的阈值电压偏移。对F-N隧穿和氧化物直接隧穿进行了模拟,然后通过电学表征和量化效应校正进行了验证。已对DAHC注射液和SCIHE注射液进行了建模,并与实验数据进行了比较。 DAHC注入和SCIHE注入机制均已应用于收敛方案,用于收敛宽单元阈值电压分布。分析了收敛操作的原理,并建立了两个设计准则。与DAHC方案相比,新提出的SCIHE方案可以显着提高收敛性能的整体性能和长期可靠性,并且可以针对块收敛进行进一步优化。

著录项

  • 作者

    Hu, Chung-You.;

  • 作者单位

    The University of Texas at Austin.;

  • 授予单位 The University of Texas at Austin.;
  • 学科 Engineering Electronics and Electrical.
  • 学位 Ph.D.
  • 年度 1995
  • 页码 148 p.
  • 总页数 148
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 无线电电子学、电信技术;
  • 关键词

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