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Dielectric properties of thin film strontium titanium oxide at microwave frequencies.

机译:薄膜锶钛氧化物在微波频率下的介电性能。

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摘要

The voltage tunable dielectric function of thin film ferroelectrics has applications to integrated microwave filters, phase shifters, and matching networks. To properly engineer these devices, the nonlinear dielectric constant and loss tangent of thin film ferroelectrics must be fully characterized at the frequencies of interest. We have developed and used a microstrip resonator technique to carry-out the necessary characterization of epitaxial SrTiO{dollar}sb3{dollar} (STO) films over a wide range of temperatures, frequencies and bias conditions. We find that the dielectric constant is roughly independent of frequency at least up to 20 GHz (especially at high bias) as would be expected of bulk STO. In contrast to the bulk behavior, however, it is observed that the dielectric constant of thin film STO achieves a maximum of approximately 2000 at about 50 K whereas the bulk dielectric constant continues to climb as the temperature is lowered. We attempt to explain this behavior in terms of the dielectric properties of bulk STO which have been tuned by an internal bias. This bias may be attributed to film strain, defect charging, or electrode effects. Our models attempt to distinguish these effects. The resonator technique also allows us to subtract-out background losses (originating in the resonator's conductors, substrate, and coupling) to arrive at a loss tangent for the ferroelectric capacitor. The loss tangent of the STO capacitor is in the 10{dollar}sp{lcub}-3{rcub}{dollar} to 10{dollar}sp{lcub}-2{rcub}{dollar} range, decreasing with increasing bias and is independent of frequency between 6 and 20 GHz. Data on {dollar}rm Basb{lcub}0.5{rcub}Srsb{lcub}0.5{rcub}TiOsb3{dollar} is also discussed.
机译:薄膜铁电体的电压可调介电功能已应用于集成微波滤波器,移相器和匹配网络。为了正确设计这些器件,必须在目标频率下充分表征薄膜铁电体的非线性介电常数和损耗角正切。我们已经开发并使用了微带谐振器技术,以在很宽的温度,频率和偏置条件下对外延SrTiO {sb3 {dollar}(STO)薄膜进行必要的表征。我们发现,介电常数大致上与频率无关,至少在20 GHz以下(尤其是在高偏置下),这与批量STO所期望的一样。然而,与整体行为相反,观察到薄膜STO的介电常数在约50K下达到最大值约2000,而随着温度降低,整体介电常数继续上升。我们试图通过内部偏置调整的大体积STO的介电特性来解释这种行为。该偏差可归因于膜应变,缺陷带电或电极效应。我们的模型试图区分这些影响。谐振器技术还允许我们减去背景损耗(起源于谐振器的导体,基板和耦合),从而得出铁电电容器的损耗角正切值。 STO电容器的损耗角正切在10 {dollar} sp {lcub} -3 {rcub} {dollar}至10 {dollar} sp {lcub} -2 {rcub} {dollar}范围内,随着偏置和与6至20 GHz之间的频率无关。还讨论了{bas} rm Basb {lcub} 0.5 {rcub} Srsb {lcub} 0.5 {rcub} TiOsb3 {dollar}的数据。

著录项

  • 作者

    Galt, David.;

  • 作者单位

    University of Colorado at Boulder.;

  • 授予单位 University of Colorado at Boulder.;
  • 学科 Physics Condensed Matter.; Engineering Electronics and Electrical.; Physics Electricity and Magnetism.
  • 学位 Ph.D.
  • 年度 1996
  • 页码 165 p.
  • 总页数 165
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 无线电电子学、电信技术;电磁学、电动力学;
  • 关键词

  • 入库时间 2022-08-17 11:49:23

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