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Computer simulation of low-pressure plasma discharges.

机译:低压等离子体放电的计算机模拟。

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Inductively Coupled Plasma (ICP) reactors are being widely investigated for use in the creation of next-generation integrated circuits. This thesis focuses upon the development of a two-dimensional computer simulation of a cylindrically symmetric ICP discharge.;The first three moment equations of the Boltzmann equation are solved for electrons and each ion neutral species to yield spatial profiles of density, velocity, and temperature. Interactions between species pairs are determined by the appropriate collision integrals for the transfer of mass, momentum, and energy. Poisson's equation is solved to determine the electrostatic plasma potential. Reaction sets for argon and chlorine chemistries are presented.;Simulation predictions for a high density plasma operated with pulsed power input are examined. Such systems show promise for relieving defects seen in etched profiles at high density conditions. While the simulation is able to capture some of the plasma characteristics seen during the afterglow period of a pulsed plasma, the simulation assumption of a Maxwellian distribution of electron energies is probably not accurate well into the plasma decay.;Initial efforts at full validation of the simulation are undertaken with comparison to available measurements in a well-defined system, the Gaseous Electronics Conference Reference Cell (GECRC). Simulation predictions for argon and chlorine discharges are compared to experimental measurements of electron density and temperature, plasma potential, negative ion density, and neutral and ion temperature. Quantitative to qualitative agreement is found in most areas, with some areas of disagreement which suggest that some of the physical processes in the model are inadequate or incomplete.;Optical emission from a high-density flowing chlorine plasma is predicted from the simulation results, and is compared to experimental emission measurements. Good agreement between simulated and experimental emission profiles is found, but the simulation shows that the actual plasma structure may be far more complex than is indicated by simple emission profiles.
机译:电感耦合等离子体(ICP)反应器正在广泛研究中,用于创建下一代集成电路。本文着重研究圆柱对称ICP放电的二维计算机模拟。;求解电子和每个离子中性物种的Boltzmann方程的前三个矩方程,以产生密度,速度和温度的空间分布图。物种对之间的相互作用由传递质量,动量和能量的适当碰撞积分确定。泊松方程被求解以确定静电等离子体电势。介绍了用于氩气和氯气化学反应的装置。;检查了使用脉冲功率输入操作的高密度等离子体的模拟预测。这样的系统显示出有望消除在高密度条件下在蚀刻轮廓中发现的缺陷的希望。虽然该模拟能够捕获在脉冲等离子体的余辉期间看到的某些等离子体特征,但电子能量的麦克斯韦分布的模拟假设可能无法很好地精确到等离子体衰变中。模拟是与定义明确的系统(气体电子会议参考单元(GECRC))中的可用测量结果进行比较的。将氩气和氯气放电的模拟预测与电子密度和温度,等离子体电势,负离子密度以及中性和离子温度的实验测量结果进行了比较。在大多数领域中发现了定量到定性的一致性,但在某些方面存在分歧,这表明该模型中的某些物理过程是不充分或不完整的;根据模拟结果可以预测高密度流动氯等离子体的光发射,以及与实验排放测量值进行比较。在模拟和实验发射曲线之间找到了很好的一致性,但是模拟显示实际的等离子体结构可能比简单的发射曲线所表明的要复杂得多。

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