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Highly sensitive single- and dual-axis high-aspect-ratio accelerometers with a CMOS precision interface circuit.

机译:具有CMOS精密接口电路的高灵敏度单轴和双轴高纵横比加速度计。

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摘要

MEMS technology focuses on producing small-scale devices in a low-cost batch fabrication of silicon micromachined structures. As the devices shrink in size, the sensor's sensitivity decreases. Making highly-sensitive small-scale sensors, and in particular, accelerometers, poses a great technology challenge. As the accelerometer is scaled down, its fundamental thermal noise increases, thus degrading its sensitivity. In addition, the area of the sensing capacitors decreases, thereby reducing the sensor's nominal capacitance and the device's responsivity and sensitivity. Input parasitic capacitance and interface capacitance limit sensor resolution. A highly-sensitive accelerometer is designed and implemented on an SOI wafer and integrated with a high-resolution capacitive measurement system. The accelerometer's measured sensitivity exceeds the sensitivity of currently available commercial devices. The major contribution of this work is a method developed to get a higher sensitivity from the device by controlling the squeeze film damping in high aspect ratio devices. A unique comb-drive design is implemented which introduces the ability to control of squeeze film damping. Squeeze film damping control allows for the design for a desired quality factor and, therefore, improves sensitivity or flattens the device's response for open-loop operation. Deep-etch RIE (DRIE) technology is used to fabricate the transducer. The fabrication process developed provides large-device scalability and an improved dynamic range. A dual-axis accelerometer is designed with a single proof-mass which improves mode matching and saves silicon area. A novel high-resolution capacitive measurement circuit is implemented in CMOS and integrated with the transducer. The circuit employs a feedback bridge to cancel supply drift and provide high stability and a wide temperature range. An active charge control feedback loop drastically reduces charge injection at the capacitive sensor's common electrode. The charge control feedback reduces the voltage error by more than two orders of magnitude and, therefore, drastically improves the sensor's resolution.
机译:MEMS技术专注于以低成本的硅微机械结构的批量制造来生产小型器件。随着设备尺寸的缩小,传感器的灵敏度降低。制造高灵敏度的小型传感器,尤其是加速度计,带来了巨大的技术挑战。随着加速度计的按比例缩小,其基本热噪声会增加,从而降低其灵敏度。另外,感测电容器的面积减小,从而减小了传感器的标称电容以及器件的响应度和灵敏度。输入寄生电容和接口电容会限制传感器的分辨率。高灵敏度的加速度计是在SOI晶片上设计和实现的,并与高分辨率电容测量系统集成在一起。加速度计测得的灵敏度超过了当前市售设备的灵敏度。这项工作的主要贡献是开发了一种方法,该方法通过控制高纵横比设备中的挤压膜阻尼来从设备中获得更高的灵敏度。实现了独特的梳齿驱动设计,该设计引入了控制挤压膜阻尼的能力。挤压膜阻尼控制允许设计达到所需的品质因数,因此可以提高灵敏度或展平设备对开环操作的响应。深度蚀刻RIE(DRIE)技术用于制造换能器。开发的制造工艺提供了大设备的可扩展性和改善的动态范围。双轴加速度计设计有单个质量保证,可改善模式匹配并节省硅面积。一种新颖的高分辨率电容测量电路在CMOS中实现,并与传感器集成在一起。该电路采用反馈桥消除电源漂移,并提供高稳定性和宽温度范围。有源电荷控制反馈环路大大减少了电容传感器公共电极上的电荷注入。电荷控制反馈将电压误差降低了两个数量级以上,因此,大大提高了传感器的分辨率。

著录项

  • 作者

    Burstein, Amit.;

  • 作者单位

    University of California, Los Angeles.;

  • 授予单位 University of California, Los Angeles.;
  • 学科 Engineering Electronics and Electrical.
  • 学位 Ph.D.
  • 年度 1999
  • 页码 335 p.
  • 总页数 335
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 无线电电子学、电信技术;
  • 关键词

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