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Surface modification of indium tin oxide for organic light-emitting diodes.

机译:用于有机发光二极管的氧化铟锡的表面改性。

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摘要

Organic light emitting diodes (OLEDs) have attracted a wide spread interest due to their potential applications in multicolor flat panel displays. OLEDs are essentially one or several organic thin film semiconductors sandwiched between two electrodes. The charge carrier injection efficiency of OLEDs is affected by the energy barrier height at the interfaces between thin layers in the device.; Indium tin oxide (ITO) is used as the anode for injection of holes into highest occupied molecular orbitals (HOMO) of the organic semiconductors in OLEDs. This thesis deals mainly with surface modification of ITO. By surface modification, the work function of ITO could be increased, and hence the energy barrier between Fermi level of the anode and HOMO of the organic semiconductor is decreased. Accordingly, the drive voltage of OLEDs could be reduced.; ITO surfaces were modified by oxygen, ammonia, and argon plasma respectively. X-ray photoelectron spectroscopy (XPS) has been used to characterize these surfaces. A surface band-bending model is proposed based on the XPS information. This band model successfully explains the change in work function of ITO after plasma treatment.; Hydrogenated amorphous carbon (a-C:H) films deposited by ethylene plasma under various conditions were also studied in this thesis. The distribution of sp3 and sp2 bonding in these films was investigated using XPS and x-ray absorption near-edge spectroscopy (XANES). The factors affecting the structure of the a-C:H films are discussed.
机译:由于有机发光二极管(OLED)在多色平板显示器中的潜在应用,引起了广泛的关注。 OLED本质上是夹在两个电极之间的一种或几种有机薄膜半导体。 OLED的电荷载流子注入效率受器件中薄层之间的界面处的能垒高度影响。氧化铟锡(ITO)用作将空穴注入OLED中有机半导体的最高占据分子轨道(HOMO)的阳极。本文主要研究ITO的表面改性。通过表面改性,可以提高ITO的功函,从而降低阳极的费米能级与有机半导体的HOMO之间的能垒。因此,可以降低OLED的驱动电压。 ITO表面分别通过氧气,氨气和氩气等离子体进行了改性。 X射线光电子能谱(XPS)已用于表征这些表面。基于XPS信息,提出了一种表面带弯曲模型。该能带模型成功地解释了等离子体处理后ITO功函的变化。本文还研究了乙烯等离子体在各种条件下沉积的氢化非晶碳(a-C:H)薄膜。使用XPS和X射线吸收近边缘光谱(XANES)研究了这些膜中sp3和sp2键的分布。讨论了影响a-C:H薄膜结构的因素。

著录项

  • 作者

    Yu, Hongyu.;

  • 作者单位

    University of Toronto (Canada).;

  • 授予单位 University of Toronto (Canada).;
  • 学科 Engineering Materials Science.; Engineering Electronics and Electrical.
  • 学位 M.A.Sc.
  • 年度 2001
  • 页码 72 p.
  • 总页数 72
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料学;无线电电子学、电信技术;
  • 关键词

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