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Gyroscope and micromirror design using vertical-axis CMOS-MEMS actuation and sensing.

机译:陀螺仪和微镜设计使用垂直轴CMOS-MEMS驱动和传感。

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This thesis introduces a deep reactive-ion-etch (DRIE) CMOS-MEMS process which incorporates bulk Si into microstructures using backside etch. The resultant microstructures are flat and have no release holes. Electrically isolated silicon is obtained using a silicon undercut. This process is suitable for applications that require large mass and flat surfaces such as inertial sensors and micromirrors.; A technique for vertical-axis sensing and actuation using comb-finger sidewall capacitance is developed. For vertical-axis sensing, this technique has small parasitic capacitance compared to the counterparts that have an electrode on the substrate. For vertical actuation, this technique has a very large gap to substrate set by the process, so that the actuation range is not limited. A unique curled comb drive design demonstrates a maximum 62 μm out-of-plane displacement for a micro-mirror scanning.; Several thin-film and DRIE devices are fabricated and characterized. A 0.5 mm by 0.5 mm microstage moves 0.3 μm vertically at 14 V d.c. Thin-film and DRIE z-axis accelerometers (both are about 0.5 mm by 0.6 mm) have noise floors of 6 mg/Hz1/2 and 0.5 mg/Hz1/2, respectively. The noise floor of a lateral-axis gyroscope is improved from 0.8°/s/Hz 1/2 for the thin-film CMOS-MEMS process to 0.02°/s/Hz1/2 for the DRIE CMOS-MEMS process.; Solutions for improving the gyroscopes' performance and yield are proposed, including a new process flow for independently controlling silicon undercut and a vertical-axis electrostatic force cancellation technique for compensating the off-axis motion.; The electrostatic micromirror rotates 5° at 18 V d.c. The thermally actuated micromirror rotates 17° at 12 mA current and has been installed into an endoscopic optical coherence tomography imaging system for in vivo imaging of biological tissue. Transverse and axial resolutions of roughly 20 μm and 10 μm, respectively, are achieved. Cross-sectional images of 500 x 1000 pixels covering an area of 2.9 x 2.8 mm2 are acquired at 5 frames/s.
机译:本文介绍了一种深反应离子刻蚀(DRIE)CMOS-MEMS工艺,该工艺使用背面刻蚀将块状Si集成到微结构中。所得的微结构是平坦的并且没有释放孔。使用硅底切获得电绝缘的硅。此过程适用于需要大质量和平坦表面的应用,例如惯性传感器和微镜。开发了一种使用梳指侧壁电容的垂直轴感测和致动技术。对于垂直轴感测,与在基板上具有电极的同类电容相比,该技术的寄生电容较小。对于垂直致动,该技术与通过该工艺设置的基板设置有很大的间隙,从而致动范围不受限制。独特的卷曲梳状驱动器设计展示了微镜扫描最大平面外位移62μm。制作并表征了几种薄膜和DRIE器件。 0.5 mm x 0.5 mm的微位移台在14 V d.c下垂直移动0.3μm。薄膜和DRIE z轴加速度计(均为约0.5 mm x 0.6 mm)的本底噪声分别为6 mg / Hz 1/2 和0.5 mg / Hz 1/2 。横向轴陀螺仪的本底噪声从薄膜CMOS-MEMS工艺的0.8°/ s / Hz 1/2 提高到0.02°/ s / Hz 1/2 用于DRIE CMOS-MEMS工艺。提出了提高陀螺仪性能和良率的解决方案,包括独立控制硅底切的新工艺流程和用于补偿轴外运动的垂直轴静电力消除技术。静电微镜在18 V d.c旋转5°。热驱动微镜在12 mA电流下旋转17°,并已安装到内窥镜光学相干断层扫描成像系统中,用于生物组织的“体内”成像。分别实现了大约20μm和10μm的横向和轴向分辨率。以5帧/秒的速度采集面积为2.9 x 2.8 mm 2 的500 x 1000像素的横截面图像。

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