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Multiscale Modeling and Control of Microstructural Defects and Surface Morphology in Thin Film Deposition.

机译:薄膜沉积中微结构缺陷和表面形态的多尺度建模和控制。

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摘要

Thin film deposition is a key process used in the manufacturing of microelectronic devices as well as in the manufacturing of thin film solar cells. Improving the ability to operate and control thin film deposition such that the deposited films have desired levels of internal microstructure and surface morphology is an issue of major technological significance, with significant implications in the efficiencies of microelectronic devices and thin film solar cells. While significant progress has been made over the last ten years on modeling and control of thin film surface roughness and porosity, there is a number of important unresolved practical issues with respect to our ability to implement the existing solutions for porosity control in practice as well as with respect to control of surface morphology metrics that directly regulate light trapping properties of thin films.;This dissertation presents a unified and practical framework for multiscale modeling and control of thin film internal microstructure and surface morphology in thin film deposition processes. Multiscale modeling provides the link between microscopic film properties like film porosity and surface morphology and macroscopically-controlled process variables like temperature and precursor flow rate and concentration. Within this multiscale modeling framework, model predictive control is used to develop novel control problem formulations and manipulated input trajectories which account for control actuator constraints and lead to a balanced trade-off in the closed-loop system between the possibly conflicting control objectives of film porosity and film surface roughness and/or slope. The proposed multiscale modeling and control methods are applied to a series of complex thin film deposition processes and extensive simulation studies are carried out to evaluate the resulting closed-loop system performance and robustness in terms of achieving key film quality metrics such as amount of internal defects and light trapping efficiency of film surface.
机译:薄膜沉积是用于微电子器件制造以及薄膜太阳能电池制造的关键工艺。改善操作和控制薄膜沉积的能力,以使沉积的薄膜具有所需水平的内部微结构和表面形态,这是一个重大技术意义的问题,对微电子器件和薄膜太阳能电池的效率具有重大影响。尽管在过去十年中,在薄膜表面粗糙度和孔隙率的建模和控制方面已取得了重大进展,但就我们在实践中以及在实践中实施孔隙率控制的现有解决方案的能力而言,仍有许多未解决的重要实际问题。直接控制薄膜的光俘获特性的表面形态学指标的控制。本文为薄膜沉积过程中薄膜内部微观结构和表面形态的多尺度建模与控制提供了一个统一而实用的框架。多尺度建模提供了微观薄膜特性(如薄膜孔隙率和表面形态)与宏观控制的工艺变量(如温度,前体流速和浓度)之间的联系。在这种多尺度建模框架内,模型预测控制用于开发新颖的控制问题公式和可操纵的输入轨迹,这些方程可说明控制执行器的约束条件,并在闭环系统中平衡可能存在的膜孔隙率控制目标之间取得平衡。以及薄膜表面粗糙度和/或斜率。拟议的多尺度建模和控制方法应用于一系列复杂的薄膜沉积工艺,并进行了广泛的仿真研究,以评估最终的闭环系统性能和鲁棒性,以实现关键的薄膜质量指标,例如内部缺陷数量膜表面的光捕获效率。

著录项

  • 作者

    Zhang, Xinyu.;

  • 作者单位

    University of California, Los Angeles.;

  • 授予单位 University of California, Los Angeles.;
  • 学科 Engineering Chemical.;Engineering Materials Science.
  • 学位 Ph.D.
  • 年度 2011
  • 页码 159 p.
  • 总页数 159
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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